Electron and Ion Beam Microscopy for Semiconductor Metrology Systems and Nano Technology Systems

The Nano Technology Systems Division of Carl Zeiss NTS provides its customers with the latest leading-edge E-Beam technology. Within this division you will find over four decades of accumulated experience in the field of scanning electron microscopy and six decades of experience in the field of transmission electron microscopy.

The company’s extensive know-how, which nowadays also comprises ion-beam technology and e-beam based analysis technology enable Carl Zeiss NTS to deliver innovative solutions for your business.

Semiconductor Metrology Systems Division

The Semiconductor Metrology Systems Division of Carl Zeiss NTS develops, manufactures, and markets equipment for the semiconductor industry. SMS concentrates its activities on solutions for inspection and repair of photomasks, which carry the complete structural information for manufacturing the most complex microchips. With core expertise in light and electron optics and comprehensive knowledge of the essential manufacturing processes of semiconductor devices, SMS provides its customers a unique solution assuring a leading position in the global market.

This information has been sourced, reviewed and adapted from materials provided by Carl Zeiss.

For more information on this source, please visit Carl Zeiss.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Carl Zeiss Microscopy GmbH. (2024, October 09). Electron and Ion Beam Microscopy for Semiconductor Metrology Systems and Nano Technology Systems. AZoNano. Retrieved on November 23, 2024 from https://www.azonano.com/article.aspx?ArticleID=1962.

  • MLA

    Carl Zeiss Microscopy GmbH. "Electron and Ion Beam Microscopy for Semiconductor Metrology Systems and Nano Technology Systems". AZoNano. 23 November 2024. <https://www.azonano.com/article.aspx?ArticleID=1962>.

  • Chicago

    Carl Zeiss Microscopy GmbH. "Electron and Ion Beam Microscopy for Semiconductor Metrology Systems and Nano Technology Systems". AZoNano. https://www.azonano.com/article.aspx?ArticleID=1962. (accessed November 23, 2024).

  • Harvard

    Carl Zeiss Microscopy GmbH. 2024. Electron and Ion Beam Microscopy for Semiconductor Metrology Systems and Nano Technology Systems. AZoNano, viewed 23 November 2024, https://www.azonano.com/article.aspx?ArticleID=1962.

Ask A Question

Do you have a question you'd like to ask regarding this article?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.