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Bright Idea Uses Big Science in Nano-Small Packages

The latest bright idea in energy-efficient lighting for homes and offices uses big science in nano-small packages to dim the future Edison's light bulb.

16 Jul 2008

Versatile Platform Offers Multiple Metrology Capabilities in a Single Tool

Nanometrics Incorporated, a leading supplier of advanced process control metrology equipment, today announced the launch of its new Lynx(TM) metrology platform at SEMICON West 2008. The Lynx is the industry's fir...

16 Jul 2008

FEI Connectivity Solutions Reduce Wafers-to-Atoms Time From Days to Hours

FEI Company, a leading provider of atomic-scale imaging and analysis systems, today announced the Ultimate Throughput™ and Ultimate Imaging™ Connectivity Solutions. By accelerating and improving the quality o...

15 Jul 2008

eHARP system Extending Proven Gap-Fill Technology for Critical STI Device Structures to 32nm and Beyond

The eHARP process delivers void-free films to fill <30nm, >12:1 aspect ratio features - essential requirements for the fabrication of advanced memory and logic devices. Featuring proprietary new process innovations, the eHARP system's robust, high-density, strain-inducing films enable the scaling of conventional planar and emerging 3-D device structures.

15 Jul 2008

Depositing Critical Barrier Films for Copper Interconnects in Sub-55nm Memory Chips

Applied Materials, Inc. today announced its Applied Endura® Extensa(TM) PVD1, the industry's only production-worthy system for depositing the critical barrier films for copper interconnects in sub-55nm memory chips.

15 Jul 2008

SUSS MicroTec Unveils Second Generation MA300 Production Mask Aligner at Semicon West 2008

At Semicon West 2008, SUSS MicroTec unveils the second generation of its MA300 Production Mask Aligner featuring a dedicated alignment kit for creating 3D interconnects for applications like chip stacking and 3D image sensor packaging. High alignment accuracy is required to enable 3D applications ranging from latest-generation mobile consumer electronics to supercomputers.

15 Jul 2008

Industry’s First Lithography System for High Volume Manufacturing at 38nm

ASML Holding NV (ASML) announces today its newest TWINSCANTM XT:1950i lithography system using a 1.35 NA lens – increasing the performance of its immersion lithography systems by 25%. The system offers improved ove...

15 Jul 2008

2,700 Hours of Continuous Operation with a Mobion Laboratory Cell

MTI MicroFuel Cells Inc., the developer of Mobion off-the-grid portable power solutions and a subsidiary of Mechanical Technology, Incorporated, announced that it has achieved 2,700 hours of continuous operation with a Mobion laboratory cell - the building block of the Company's Mobion chip and systems.

15 Jul 2008

SurModics Licensed Lipid Nanoparticle Technology from PharmaSol

SurModics, Inc., a leading provider of surface modification and drug delivery technologies to the healthcare industry, announced today that its Brookwood Pharmaceuticals subsidiary has licensed lipid nanoparticle technol...

15 Jul 2008

Industrial Nanotech Releases Second Addition Nansulate EPX Line

Industrial Nanotech, Inc., an emerging global leader in nanotechnology, today announced that the Company has released a second addition to their patented revolutionary new water-based Nansulate EPX line. EPX-K will offer...

15 Jul 2008

Physicists Reduce Casimir Force by Altering Surface of Plates

University of Florida physicists have found they can reduce the Casimir force by altering the surface of the plates. The discovery could prove useful as tiny “microelectromechanical” systems — so-called MEMS devices that are already used in a wide array of consumer products — become so small they are affected by quantum forces.

15 Jul 2008