Nanofabrication News

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Article Focuses on CVD's Solutions for Depositing Transparent Conductive Oxide on Glass

CVD Equipment Corporation (CVD) (NASDAQ: CVV), announced today that an article about the Company was published in the November issue of Photovoltaics World magazine titled "Off-line APCVD offers paradigm shift for TCO gl...

24 Nov 2009

AIXTRON Receives Order for MOCVD System from HRL Laboratories

AIXTRON AG today announced an order for one Close Coupled Showerhead (CCS) 6x2 inch MOCVD system from HRL Laboratories LLC, based in Malibu, USA. The order was received in the third quarter 2009 and the system will be de...

From AIXTRON SE 24 Nov 2009

Nanotechnology Researcher Named Arkansas Professor of the Year

The Carnegie Foundation for the Advancement of Teaching and the Council for Advancement and Support of Education has announced the national and state Professor of the Year Awards. Physicist Greg Salamo, the Joe N. Basore Professor in Nanotechnology and Innovation in the J. William Fulbright College of Arts and Sciences, was named Arkansas Professor of the Year.

23 Nov 2009

Fabricating 3-D Single-Crystalline Silicon Structures from Thin Films

You can think of it as origami – very high-tech origami. Researchers at the University of Illinois have developed a technique for fabricating three-dimensional, single-crystalline silicon structures from thin films...

23 Nov 2009

Hosokawa Micron Announces the Launch of NanoCreator FCM-Mini

Hosokawa Micron Ltd announce the launch of the NanoCreator FCM-Mini, a continuous nano-particle production system for metal oxides. High purity particles are created by the build up method that allows particles to be adjusted from a few nm to a few hundred nm. The NanoCreator FCM-Mini is able to create single component particles or multi-metal oxide components.

20 Nov 2009

Applied Nanotech Inkjet Printed Nanoparticle Copper Inks onto Paper

Applied Nanotech Holdings, Inc. (OTCBB: APNT) announced that it has successfully inkjet printed its nanoparticle copper inks onto commercially available paper substrates forming highly conductive patterns for electronic ...

From Nano Magic, LLC. 19 Nov 2009

Toshiba Corporation Developed High Resolution Photoresist

Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.

19 Nov 2009

Synthesizing Graphene-Like Polymer with Well Defined Pores

Physicists at Empa, Switzerland, together with chemists from the Max Planck Institute for Polymer Research in Mainz, Germany, have, for the first time, succeeded in synthesizing a graphene-like porous polymer with atomic accuracy.

19 Nov 2009

STnano Purchases Plasmalab System80 Plus ICP System from Oxford Instruments Plasma Technology

Oxford Instruments Plasma Technology (OIPT) has recently won a contract with French research centre, STnano in Strasbourg, France for the supply of a Plasmalab® System80 Plus ICP system.

From Oxford Instruments Plasma Technology 18 Nov 2009

Computer-Based Tool Helping World's Semiconductor Manufacturing Facilities Evaluate and Improve Energy Efficiency

Scientists at the Department of Energy's Lawrence Berkeley National Laboratory, in cooperation with the International SEMATECH Manufacturing Initiative (ISMI), are releasing for beta testing a computer-based tool to help the world's semiconductor manufacturing facilities ("fabs") evaluate and improve their energy efficiency.

18 Nov 2009