Researchers can perform in-depth observations of novel type of materials in order to study their behavior and structure.
This was made possible by a research team headed by UC Davis in collaboration with the Lawrence Berkeley National Laboratory. This study was published by the journal, Nature Materials.
The technique will allow a comprehensive study of novel material types for applications in chemistry, energy production, electronics, and others. Since the 1970s, researchers have used a technique known as angle-resolved photoemission for studying material characteristics including magnetism, superconductivity, and semiconductivity. However, it was possible to study only to a depth of 1 nm beneath the material’s surface due to robust inelastic dispersion of the ejected electrons.
The new research team utilized a high-intensity X-ray source, which is controlled by the Japanese National Institute for Materials Sciences located at the SPring8 synchrotron radiation facility, Hyogo, Japan. This enabled them to observe the material for a greater depth thus obtaining more data and reducing surface effects.
The new technique follows the principle of photoelectric effect according to which, shooting of a photon into a material knocks out the electron. By measuring the spin, energy, and angle of the emitted electrons, researchers learn more about electron bonding and movement taking place in the material.
Earlier, the technique utilized energies ranging from 10 to 150 eV. At the Japanese facility, the team was able to increase the energy to as much as 6,000 eV, which increased the viewing depth up to 20 fold. The collecting of precise information was also possible by the researchers through the use of uniquely designed spectrometers, particularly cameras for observing electrons. The new technique can be applied both for commercial and basic research on novel materials used in technology and electronics.