Tokyo Electron Limited (TEL), a global provider of semiconductor and FPD production equipment, has joined two of CEA-Leti’s collaborative and open industrial lithography programs, IMAGINE and IDEAL.
MAPPER has developed a maskless lithography technology, and CEA-Leti’s IMAGINE program supports the launch and evolution of this high-throughput technology. After joining, TEL will become the 15th industrial partner of this program.
The IDEAL program is a new endeavor for development of 300 mm directed self-assembly (DSA) material and process solutions for nodes of sub-20 nm. TEL has also joined this program, which was launched in the latter half of 2011.
CTBU General Manager & VP, Toshi Nishigaki stated that maskless lithography (ML2) and directed self-assembly are the emerging technologies for semiconductor device patterning. Leti has experience in directed self-assembly and electron-beams, and the partnership with Leti will help progress semiconductor patterning solutions, he added.
CEA-Leti’s program manager, Serge Tedesco commented that the joining of TEL in the DSA and ML2 development programs sends a strong message about the advancement of lithography solutions for the next sophisticated nodes. TEL’s experience will aid in the advancement of next generation lithography solutions. CEA-Leti has been collaborating with TEL in various microelectronics fields, he added.
The French research and technology organization, CEA specializes in healthcare technologies, energy, defence and security and information technologies. The Laboratory for Electronics & Information Technology (Leti), within the CEA, focuses on collaborating with companies and provides technological innovation and transfers to enhance their competitiveness. Nanoelectronics, MEMS and other nanotechnologies for healthcare, photonics, biology and wireless devices and system applications are the major activities of CEA-Leti.