Plasma Cleaning Systems

Plasma cleaning is the common technique of getting rid of organic matter from an object’s surface by means of an ionized gas known as plasma. The technique frequently performed in a vacuum chamber using oxygen or argon gas. A plasma cleaning system is an environmentally-safe alternative to using harsh chemical solvents and an efficient way to remove small quantities of contaminants from a substrate.

When a gas takes up electrical energy, it grows hotter, triggering the ions to vibrate faster and “scrub” a surface. In semiconductor production, plasma cleaning is often employed to prepare a wafer surface just before wire bonding. Getting rid of any contamination leads to stronger wire bond adhesion, which boosts the dependability and endurance of a device.

In biomedical uses, plasma cleaning is used to boost compatibility between artificial biomaterials and natural tissues. Plasma cleaning reduces adverse reactions like inflammation and infection.