Nanoelectronics News

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Fujitsu Launches New Graphics SoC Based on its 90nm CMOS Process Technology

SFT Unveils New Versions of Post-Layout Verification Products for Nanometer Design

Collaboration at CNSE's Albany NanoTech Complex will Target Mask Defects at 22 nm and Below

Major Foundry Chooses Axcelis' Integra Dry Strip System for its IC Production Facility

Smart Imaging to Showcase New Image-Based Full-Chip Validation Tool at SPIE's Advanced Lithography 2010

Omron Electronic Components Launches New Connector Catalog

Open-Silicon, Virage Logic Join to Offer Comprehensive SoC Design Solutions

Usage of Germanium Enables Faster Chips Containing Smaller Transistors

Tanner EDA, Sound Design Technologies to Jointly Develop PDKs for Thin Film Technologies

Soitec Reports Volume Production of its HR Silicon-on-Insulator Substrates

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