Nanolithography News

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nPoint Inc. Announce Release of Two New Piezo Stages

With a position noise of 0.4nm in X and Y axis and 0.2nm in the Z, both stages provide the accuracy necessary for today’s advanced applications. When paired with the LC.400 series DSP controllers, the system provides closed-loop capability via capacitive sensors.

From Motion Solutions 14 May 2014

Researchers Combine Silk Proteins with Photolithography

When most people think of silk, the idea of a shimmering, silk scarf, or luxurious gown comes to mind.

13 May 2014

Global Semiconductor Dry Etching Equipment to Grow at 2.27% CAGR from 2013 to 2018

Research and Markets have announced the addition of the "Global Semiconductor Dry Etching Market 2014-2018" report to their offering.

From Research and Markets 26 Apr 2014

Research and Markets Adds Report on Global Atomic Layer Deposition Market 2014 - 2018

Research and Markets has announced the addition of the "Global Atomic Layer Deposition Market 2014-2018" report to their offering.

From Research and Markets 26 Apr 2014

New Mask Aligner MA200 Gen3 Tool for High Volume Manufacturing Launched by SÜSS MicroTec

SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, has launched the new Mask Aligner MA200 Gen3 today. The tool is designed for high volume manufacturing and can be used for exposing wafers with a diameter of up to 200 mm.

From SUSS MicroTec AG 4 Apr 2014

OAI Unveils New Non-Contact Lithography System PhableR 100

OAI, designers and manufacturers of precision, cost-effective equipment for the Semiconductor MEMS, PV solar energy, nanotechnology and microfluidics today introduced the new non-contact lithography system PhableR 100.

27 Mar 2014

Demand Drives R&D in Micro-Opto-Electro-Mechanical Systems

Commercial demand is driving high-tech research and development in micro-opto-electro-mechanical systems (MOEMS) for diverse applications such as space exploration, wireless systems, and healthcare. A new special section on Emerging MOEMS Technology and Applications in the current issue of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) gathers recent breakthrough achievements and explains how such innovations in the photonics field are poised to emerge in the marketplace. The journal is published by SPIE, the international society for optics and photonics.

26 Mar 2014

Marvell Introduces 88X3240P Ethernet Transceiver Manufactured Using 28nm Lithography

Marvell today announced the Marvell® Alaska® X 88X3240P quad-port Ethernet PHY, designed to bring the benefits of IEEE 10GBASE-T standard to a host of equipment types, ranging from data center and enterprise switches to storage and server equipment.

19 Mar 2014

EV Group China to Serve as Regional Headquarters for EVG's Operations in China

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has opened a new, wholly owned subsidiary in Shanghai, called EV Group China Ltd., which will serve as regional headquarters for all of EVG's operations in the People's Republic of China.

From EV Group 18 Mar 2014

EVG’s NanoSpray Technology Now Available on EVG150XT Resist Coating and Developing System

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that its patented NanoSpray conformal coating technology is now available on its newly introduced EVG150XT resist coating and developing system for high-volume manufacturing (HVM) semiconductor applications.

From EV Group 13 Mar 2014

Nanolithography News

nPoint Inc. Announce Release of Two New Piezo Stages

Researchers Combine Silk Proteins with Photolithography

Global Semiconductor Dry Etching Equipment to Grow at 2.27% CAGR from 2013 to 2018

Research and Markets Adds Report on Global Atomic Layer Deposition Market 2014 - 2018

New Mask Aligner MA200 Gen3 Tool for High Volume Manufacturing Launched by SÜSS MicroTec

OAI Unveils New Non-Contact Lithography System PhableR 100

Demand Drives R&D in Micro-Opto-Electro-Mechanical Systems

Marvell Introduces 88X3240P Ethernet Transceiver Manufactured Using 28nm Lithography

EV Group China to Serve as Regional Headquarters for EVG's Operations in China

EVG’s NanoSpray Technology Now Available on EVG150XT Resist Coating and Developing System

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Harnessing Biology for Sustainable Energy Production

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

Sponsored Content

Characterization of Active Pharmaceutical Ingredients, Injectables, and Proteins

The Future of Wound Care: Why Nanofibers are Key to Accelerated Healing

The Evolution of Lipid Nanoparticles

How Emulsion Electrospinning is Transforming Materials