Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company’s flagship high-power ArF Immersion Laser (GT64A) will be used by the Global 450 Consortium (G450C), headquartered at SUNY’s College of Nanoscale Science and Engineering (CNSE) in Albany, New York, as the light source for its first 450mm ArF Immersion lithography scanners.
Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has achieved 43W output at 100kHz from its second prototype laser-produced plasma (LPP) light source for EUV lithography scanners.
Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical lithography platforms.
Rudolph Technologies, Inc. announced today it has received two orders for its lithography systems, totaling more than $11 million. Purchase orders include a repeat order for the JetStep™ Lithography System for advanced packaging (AP) applications and a repeat order for a PanelPrinter™ 9200 System for flat panel display (FPD) lithography.
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG®720 automated UV nanoimprint lithography (UV-NIL) system. Providing full-field imprint lithography with an integrated soft stamp/template fabrication capability, the EVG720 system enables throughputs of more than 60 wafers per hour with the lowest cost of ownership (CoO).
Research and Markets has announced the addition of the "Lithography, Deposition, and Etch Market Analysis for Flip Chip/WLP Manufacturing" report to their offering.
Photronics, Inc. , a worldwide leader in supplying innovative imaging technology solutions for the global electronics industry, today announced an agreement with Dai Nippon Printing Co., Ltd. (DNP) (7912:Tokyo Stock Exchange) to merge Photronics Semiconductor Mask Corporation (PSMC), a majority owned subsidiary of Photronics, with DNP Photomask Technology Taiwan Co., Ltd. (DPTT), a wholly owned subsidiary of DNP, to form a joint venture focused on serving semiconductor manufacturers in Taiwan.
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG®PHABLE™ exposure system, which is designed specifically for manufacturing photonic components.
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful.
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has delivered an EVG®6200 semi-automated mask alignment system to Micronit, a manufacturer of lab-on-a-chip products used in life sciences applications, such as molecular diagnostics and point-of-care, as well as micro-processed glass substrates for MEMS applications.
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