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Gigaphoton Achieves 43W Output at 100kHz from LPP Light Source

Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has achieved 43W output at 100kHz from its second prototype laser-produced plasma (LPP) light source for EUV lithography scanners.

17 Feb 2014

Molecular Imprints to Sell Semiconductor Imprint Lithography Equipment Business to Canon

Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical lithography platforms.

14 Feb 2014

Rudolph Receives $11 Million Order for Lithography Systems

Rudolph Technologies, Inc. announced today it has received two orders for its lithography systems, totaling more than $11 million. Purchase orders include a repeat order for the JetStep™ Lithography System for advanced packaging (AP) applications and a repeat order for a PanelPrinter™ 9200 System for flat panel display (FPD) lithography.

From Onto Innovation 4 Feb 2014

New Market Analysis Report on Lithography, Deposition and Etch for Flip Chip/WLP Manufacturing

Research and Markets has announced the addition of the "Lithography, Deposition, and Etch Market Analysis for Flip Chip/WLP Manufacturing" report to their offering.

29 Nov 2013

Photronics DNP JV to Cater to Taiwan’s Semiconductor Manufacturers

Photronics, Inc. , a worldwide leader in supplying innovative imaging technology solutions for the global electronics industry, today announced an agreement with Dai Nippon Printing Co., Ltd. (DNP) (7912:Tokyo Stock Exchange) to merge Photronics Semiconductor Mask Corporation (PSMC), a majority owned subsidiary of Photronics, with DNP Photomask Technology Taiwan Co., Ltd. (DPTT), a wholly owned subsidiary of DNP, to form a joint venture focused on serving semiconductor manufacturers in Taiwan.

21 Nov 2013

New Publication Outlines New Developments in Nanolithography

Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful.

19 Nov 2013

Rigaku Innovative Technologies Unveils New EUV Lithography Product Line at 2013 International Symposium

Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optic technology for EUV lithography (EUVL), has unveiled its new line of EUVL solutions to support high volume EUV Lithography in conjunction with successful appearances at the 2013 International Symposium on Extreme Ultraviolet Lithography in Toyama, Japan.

22 Oct 2013

Artificial Cell Membranes can be Written on Graphene Using Lipid Dip-Pen Nanolithography

Graphene emerges as a versatile new surface to assemble model cell membranes mimicking those in the human body, with potential for applications in sensors for understanding biological processes, disease detection and drug screening.

11 Oct 2013

EV Group and ICON Develop Roll-To-Roll Thermal Nanoimprint Lithography Tool

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG®570R2R—the industry's first roll-to-roll thermal nanoimprint lithography (NIL) tool.

9 Oct 2013

SUSS MicroTec and SEMATECH Partner to Improve EUVL Pattern Mask Cleaning Yields

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec’s photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.

From SUSS MicroTec AG 8 Oct 2013