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Asian OSAT Company Places Repeat Order for Ultratech Lithography System

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs) announced that it has received a repeat order from a leading outsourced semiconductor assembly and test (OSAT) company in Asia.

3 Jul 2013

Nikon Partners with SUNY’s CNSE to Develop Next Generation Lithography Technology

Governor Andrew M. Cuomo today announced that Nikon Corporation, a world leader in digital imaging technology and computer chip development, has partnered with SUNY’s College of Nanoscale Science and Engineering (CNSE) in a $350 million investment to develop the first of its kind next generation lithography technology on 450mm wafer and create 100 high-tech jobs.

From College of Nanoscale Science and Engineering, University at Albany 3 Jul 2013

Gigaphoton Delivers ArF Immersion Excimer Laser for Multi-Patterning Lithography

Gigaphoton, Inc. a major lithography light source manufacturer, announced today that it has completed delivery of its first ArF immersion Excimer laser supporting 450mm multi-patterning, the GT64A, to a major lithography scanner manufacturer.

2 Jul 2013

Gigaphoton Reports Successful Continuous Operation of EUV Lithography Scanner LPP Light Source

Gigaphoton, Inc. a major lithography light source manufacturer, announced today that it has successfully achieved 2 hour continuous operation of its laser-produced plasma (LPP) light source for EUV lithography scanners. This milestone was confirmed using a prototype LPP system which generates EUV light by irradiating Tin (Sn) Droplets with a solid-state pre-pulse laser and a CO2 main pulse laser.

2 Jul 2013

Advanced Extreme-Ultraviolet Microscope to go Online at Berkeley Lab

The world’s most advanced extreme-ultraviolet microscope is about to go online at the U.S. Department of Energy (DOE)’s Lawrence Berkeley National Laboratory (Berkeley Lab), and the queue of semiconductor companies waiting to use it already stretches out the door.

From Lawrence Berkeley National Laboratory 26 Jun 2013

ZEISS’ New Photomask Repair Tool Offers High Level of Automation and Flexibility

The new generation system MeRiT® HR II from ZEISS offers a significantly higher degree of automation and increased flexibility in the repair of transparent and opaque defects. Any defect geometry on all known as well as new mask types and materials can be processed: Binary, OMOG, HD MoSi and EUV.

20 Jun 2013

Breakthrough Technique Enables 3D Optical Beam Lithography at Nine Nanometers

A research team at Swinburne University of Technology has overcome a fundamental law of optical science that could lead to faster and more energy-efficient optical computing.

20 Jun 2013

CEA-Leti to Host Workshop on Future Technology Developments at SEMICON West 2013

CEA-Leti will host a workshop at SEMICON West 2013 on major technology developments in the next 10 years.

From CEA-Leti 20 Jun 2013

Researchers Carve Nano-Volcanoes Using Light

Researchers from North Carolina State University have developed a method for creating “nano-volcanoes” by shining various colors of light through a nanoscale “crystal ball” made of a synthetic polymer. These nano-volcanoes can store precise amounts of other materials and hold promise for new drug-delivery technologies.

From North Carolina State University 15 Jun 2013

Robust New Method for Arranging Metal Nanoparticles in Geometric Patterns for Optical Processing

Rice University scientists have unveiled a robust new method for arranging metal nanoparticles in geometric patterns that can act as optical processors that transform incoming light signals into output of a different color. The breakthrough by a team of theoretical and applied physicists and engineers at Rice’s Laboratory for Nanophotonics (LANP) is described this week in the Proceedings of the National Academy of Sciences.

22 May 2013

Nanolithography News

Asian OSAT Company Places Repeat Order for Ultratech Lithography System

Nikon Partners with SUNY’s CNSE to Develop Next Generation Lithography Technology

Gigaphoton Delivers ArF Immersion Excimer Laser for Multi-Patterning Lithography

Gigaphoton Reports Successful Continuous Operation of EUV Lithography Scanner LPP Light Source

Advanced Extreme-Ultraviolet Microscope to go Online at Berkeley Lab

ZEISS’ New Photomask Repair Tool Offers High Level of Automation and Flexibility

Breakthrough Technique Enables 3D Optical Beam Lithography at Nine Nanometers

CEA-Leti to Host Workshop on Future Technology Developments at SEMICON West 2013

Researchers Carve Nano-Volcanoes Using Light

Robust New Method for Arranging Metal Nanoparticles in Geometric Patterns for Optical Processing

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

Boosting Hydrogen Fuel Production with TiO2 and Copper-Based MOFs

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

N-Doped Ti3O5: Enhanced Photocatalytic Removal of Phenolic Compounds from Wastewater

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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