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ZEISS’ New Photomask Repair Tool Offers High Level of Automation and Flexibility

The new generation system MeRiT® HR II from ZEISS offers a significantly higher degree of automation and increased flexibility in the repair of transparent and opaque defects. Any defect geometry on all known as well as new mask types and materials can be processed: Binary, OMOG, HD MoSi and EUV.

20 Jun 2013

Breakthrough Technique Enables 3D Optical Beam Lithography at Nine Nanometers

A research team at Swinburne University of Technology has overcome a fundamental law of optical science that could lead to faster and more energy-efficient optical computing.

20 Jun 2013

CEA-Leti to Host Workshop on Future Technology Developments at SEMICON West 2013

CEA-Leti will host a workshop at SEMICON West 2013 on major technology developments in the next 10 years.

From CEA-Leti 20 Jun 2013

Innovative Single-Wafer Photoresist and Residue Removal Technology for MEMS Markets

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment, and Dynaloy, LLC, an international manufacturer of chemicals for the electronics industry and wholly owned subsidiary of Eastman Chemical Company, today introduced CoatsClean™-an innovative single-wafer photoresist and residue removal technology designed to address thick films and difficult-to-remove material layers for the 3D-ICs/through-silicon vias (TSVs), advanced packaging, microelectromechanical systems (MEMS) and compound semiconductor markets.

From EV Group 18 Jun 2013

Researchers Carve Nano-Volcanoes Using Light

Researchers from North Carolina State University have developed a method for creating “nano-volcanoes” by shining various colors of light through a nanoscale “crystal ball” made of a synthetic polymer. These nano-volcanoes can store precise amounts of other materials and hold promise for new drug-delivery technologies.

From North Carolina State University 15 Jun 2013

Robust New Method for Arranging Metal Nanoparticles in Geometric Patterns for Optical Processing

Rice University scientists have unveiled a robust new method for arranging metal nanoparticles in geometric patterns that can act as optical processors that transform incoming light signals into output of a different color. The breakthrough by a team of theoretical and applied physicists and engineers at Rice’s Laboratory for Nanophotonics (LANP) is described this week in the Proceedings of the National Academy of Sciences.

22 May 2013

Nanonex Corporation Announce Installation of New Nanoimprint Lithography Technology

Nanonex Corporation, a pioneer and leading company in nanoimprint solutions, today announced the successful delivery and installation of a new nanoimprint lithography (NIL) manufacturing system, the NX-M200B, to a major ...

From Nanonex Corporation 21 May 2013

Nanoscale Magnetic Material When Sorted on a Lattice Align in Chain Pattern

Physicists at the Ruhr-Universität Bochum (RUB) have found out how tiny islands of magnetic material align themselves when sorted on a regular lattice - by measurements at BESSY II. Contrary to expectations, the north and south poles of the magnetic islands did not arrange themselves in a zigzag pattern, but in chains.

16 May 2013

Dr. Stephen Y. Chou, Founder of Nanonex Corporation to give Tutorial on 'Nanoimprint Lithography and Applications' at IEEE Nano 2013

Dr. Stephen Y. Chou, Founder of Nanonex Corporation, will be giving a tutorial titled “Nanoimprint Lithography and Applications” at IEEE Nano 2013 in Beijing, China, on August 5th 2013. Nanoimprint, invent...

From Nanonex Corporation 16 May 2013

Northwestern University Nanotechnology Scientist Wins Royal Society of Chemistry Award

Northwestern University scientist Chad A. Mirkin, a world-renowned leader in nanotechnology research and its application, has been named 2013 Chemistry World Entrepreneur of the Year by the Royal Society of Chemistry (RSC). The award recognizes an individual’s contribution to the commercialization of research.

10 May 2013

Nanolithography News

ZEISS’ New Photomask Repair Tool Offers High Level of Automation and Flexibility

Breakthrough Technique Enables 3D Optical Beam Lithography at Nine Nanometers

CEA-Leti to Host Workshop on Future Technology Developments at SEMICON West 2013

Innovative Single-Wafer Photoresist and Residue Removal Technology for MEMS Markets

Researchers Carve Nano-Volcanoes Using Light

Robust New Method for Arranging Metal Nanoparticles in Geometric Patterns for Optical Processing

Nanonex Corporation Announce Installation of New Nanoimprint Lithography Technology

Nanoscale Magnetic Material When Sorted on a Lattice Align in Chain Pattern

Dr. Stephen Y. Chou, Founder of Nanonex Corporation to give Tutorial on 'Nanoimprint Lithography and Applications' at IEEE Nano 2013

Northwestern University Nanotechnology Scientist Wins Royal Society of Chemistry Award

Harnessing Biology for Sustainable Energy Production

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Low-Temperature Synthesis of Ultrathin Two-Dimensional Materials via BiOCl-Assisted CVD

Enhancing Material Properties through Nanotube Encapsulation

Unraveling the Mysteries of Nanobubble Stability

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

Sponsored Content

Characterization of Active Pharmaceutical Ingredients, Injectables, and Proteins

The Future of Wound Care: Why Nanofibers are Key to Accelerated Healing

The Evolution of Lipid Nanoparticles

How Emulsion Electrospinning is Transforming Materials