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Major Lithography Light Source Manufacturer Commences Business Operations at New Branch in Singapore

Gigaphoton, Inc., a major lithography light source manufacturer, announced today that as of April 2013, it has started business operations at the Gigaphoton Singapore Branch ("GPSB"), its newly established branch in that country.

6 Apr 2013

Applied Nanotech to Present Advancements in Inks and Pastes at Printed Electronics Europe 2013

Applied Nanotech Holdings, Inc. announced that its subsidiary, Applied Nanotech, Inc., will be presenting its latest advancements in inks and pastes for printed electronic applications at the prestigious 10th International Conference and Trade Show on printed electronics organized by IDTechEx in Berlin, Germany April 17-18, 2013.

3 Apr 2013

Photonic Quasicrystals Hold Potential for Smaller Optical Circuits and Lithography

Ever since their discovery in 1984, the burgeoning area of research looking at quasiperiodic structures has revealed astonishing opportunities in a number of areas of fundamental and applied research, including applications in lasing and sensing.

21 Mar 2013

Owens Design Partners to Develop Advanced Nanoimprint Lithography Tool

Owens Design Inc. today announced the completion of a collaborative tool development effort with a leading innovator in the field of nanoimprint technology.

13 Mar 2013

Cymer Announce Development Milestone for EUV Lithography

A significant milestone in extreme ultraviolet (EUV) lithography was reported by Cymer's David Brandt last week at SPIE Advanced Lithography 2013 in San Jose. The event, which drew more than 2200 attendees, ran Feb. 24-28.

From Cymer, Inc. 8 Mar 2013

Rolith Reports Successful Installation of 2nd-Generation Nanostructuring Prototype Tool

Rolith, Inc., the leader in developing advanced nanostructured coatings and devices, today announces the successful installation of a 2nd-generation nanostructuring prototype tool built by SUSS MicroTec AG under exclusive license from Rolith, Inc. – the RML-2 tool.

5 Mar 2013

Combination of Innovative Nanotechnologies May Allow Doubling of Hard Disk Drive Density

HGST (formerly Hitachi Global Storage Technologies and now a Western Digital company, NASDAQ: WDC) is leading the disk drive industry to the forefront in nanolithography, long the exclusive purview of semiconductor manufacturers, by creating and replicating minute features that will allow the doubling of hard disk drive (HDD) density in future disk drives.

1 Mar 2013

MagnaChip Implements Proteus LRC for Cost-Effective Lithography Verification

Synopsys, Inc., a global leader providing software, IP and services used to accelerate innovation in chips and electronic systems, today announced the adoption of Synopsys' Proteus™ LRC by MagnaChip Semiconductor Corporation, a Korea-based designer and manufacturer of analog and mixed-signal semiconductor products.

From Synopsys, Inc. 26 Feb 2013

Luminescent, DNP Partner to Reduce Photomask Defect Review and Analysis Cycle Time

Luminescent Technologies Inc. (Luminescent), the leading provider of Computational Metrology and Inspection solutions for the global semiconductor manufacturing industry and Dai Nippon Printing Company, Ltd. (DNP) announced today the successful completion of the first phase of a three (3)-year joint development program for computational metrology and inspection using Luminescent's Automated Image Processing Hub (LAIPH) platform.

26 Feb 2013

Pioneering Research at SUNY College of Nanoscale Science and Engineering Presented at Lithography Conference

Continuing to support the vision and leadership of Governor Andrew Cuomo through which New York is being transformed into the worldwide epicenter for nanotechnology, the SUNY College of Nanoscale Science and Engineering (CNSE) announced today that pioneering scientific research conducted at CNSE’s Albany NanoTech Complex has contributed to nearly 50 technical papers being presented at the world’s preeminent lithography conference.

From College of Nanoscale Science and Engineering, University at Albany 22 Feb 2013

Nanolithography News

Major Lithography Light Source Manufacturer Commences Business Operations at New Branch in Singapore

Applied Nanotech to Present Advancements in Inks and Pastes at Printed Electronics Europe 2013

Photonic Quasicrystals Hold Potential for Smaller Optical Circuits and Lithography

Owens Design Partners to Develop Advanced Nanoimprint Lithography Tool

Cymer Announce Development Milestone for EUV Lithography

Rolith Reports Successful Installation of 2nd-Generation Nanostructuring Prototype Tool

Combination of Innovative Nanotechnologies May Allow Doubling of Hard Disk Drive Density

MagnaChip Implements Proteus LRC for Cost-Effective Lithography Verification

Luminescent, DNP Partner to Reduce Photomask Defect Review and Analysis Cycle Time

Pioneering Research at SUNY College of Nanoscale Science and Engineering Presented at Lithography Conference

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

Boosting Hydrogen Fuel Production with TiO2 and Copper-Based MOFs

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

N-Doped Ti3O5: Enhanced Photocatalytic Removal of Phenolic Compounds from Wastewater

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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