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Raith and Vistec Lithography Merge to Form One Lithography and Nanofabrication Solution Provider

Effective February 15, 2013, Raith and Vistec Lithography announce that they unite their worldwide activities for electron and ion beam lithography and nanofabrication instruments to form one solution provider. Raith has...

From Raith 20 Feb 2013

SEMATECH to Present Metrology Advances and EUV Mask Blanks at SPIE 2013

SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2013 conferences taking place February 25-28 at the San Jose Convention Center and Marriott in San Jose, CA.

20 Feb 2013

Gigaphoton Launches Excimer Lasers for 450mm Wafer Production Applications

Gigaphoton, Inc., a major lithography light source manufacturer, announced today that its state-of-the-art GT64A ArF excimer lasers for scanners targeting 450mm wafer production are now available for order. The GT64A is the latest advancement in Gigaphoton's continuously evolving ArF platform.

19 Feb 2013

Gigaphoton Reports Achievement of 20W EUV Light Output for LPP Light Sources

Gigaphoton, Inc. a major lithography light source manufacturer, announced today that the company has achieved EUV light output equivalent to maximum of 20W for its laser-produced plasma (LPP) light sources for EUV lithography scanners.

19 Feb 2013

Researchers Develop Origami-Inspired Self-Assembling Particles to Advance Nanotechnology Research

The nanotechnology research space is rapidly growing, with vast implications for the healthcare, consumer electronics, surveillance, and defense industries. However, a major limitation to this research is the ability to create particles that vary in shape and function on a micrometer or nanometer scale.

14 Feb 2013

Nanoscribe Showcases 3D Printer of Micro- and Nanostructures at Photonics West

At the Photonics West, the leading international fair for photonics taking place in San Francisco (USA) this week, Nanoscribe GmbH, a spin-off of Karlsruhe Institute of Technology (KIT), presents the world's fastest 3D printer of micro- and nanostructures.

11 Feb 2013

Synopsys’ 28-nm Lithography Hot-Spot Checking Technology Adopted by UMC

Synopsys, Inc., a global leader providing software, IP and services used to accelerate innovation in chips and electronic systems, today announced that United Microelectronics Corporation (UMC) has selected Synopsys' IC Validator physical verification product for lithography hot-spot checking at the 28-nm process node.

From Synopsys, Inc. 8 Feb 2013

Element Six Expands Manufacturing of Synthetic Diamond Optical Windows for LLP EUV Lithography Systems

At SPIE Photonics West 2013, Element Six, the world leader in synthetic diamond supermaterials and member of the De Beers Group of Companies, today announced its Silicon Valley facility has expanded its high volume manufacturing capabilities of synthetic diamond optical windows, a critical component of Laser Produced Plasma (LLP) Extreme Ultraviolet (EUV) lithography systems.

5 Feb 2013

Nanoscientists Utilize Uglestad Microbeads to Trap More Light in Solar Cells

Nanoscientists are currently developing the next generation of solar cells, which will be twenty times thinner than current solar cells.

30 Jan 2013

Researchers Combine Atom-Thick Graphene and Boron Nitride to Create 2-D Electronics

Rice University scientists have taken an important step toward the creation of two-dimensional electronics with a process to make patterns in atom-thick layers that combine a conductor and an insulator.

28 Jan 2013