Light has become one of our most powerful servants, carrying information ranging from a chat room "LOL" to an entire digitized movie through hundreds of miles of fiber optics in seconds. But like many servants, light is sometimes uncooperative. Among other things, it doesn't like to go around tight corners. Cornell and Massachusetts Institute of Technology researchers have a solution that could offer increased bandwidth for fiber-optic communication, both in long-haul transmission and in the dense traffic in large data centers.
Rolith, Inc., the leader in developing advanced nanostructured coatings and devices, today announced that it has received an exclusive license to methods of micro and nano-patterning substrates to make transparent conductive electrodes from the University of Michigan Office of Technology Transfer (U-M Tech Transfer).
SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, hosted the SUSS MicroTec Japan Seminar 2012 on December 4, at the Hyatt Regency Tokyo. In two parallel tracks the latest developments in 3D Integration and Next Generation Lithography as 193i, EUVL and NIL were presented and discussed. Both seminars attracted approximately 200 attendees.
Dow Electronic Materials, a business unit of The Dow Chemical Company, today announced two key commercial-ready technologies for leading-edge semiconductor and printed circuit board (PCB) manufacturing.
EV Group (EVG) a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, announced the completion of its newly expanded cleanroom IV facility at its corporate headquarters in Austria.
The SCHOTT technology group has developed a nanostructuring technique for surfaces that already ranks among the important emerging technologies: so-called nanoimprint lithography. This technological platform should provide the basis for a wide range of innovative applications including decorative stainless steel appearances for glass, OLED applications and even photonic crystals.
Two research projects with a combined budget approaching 70 million euro achieved significant advances in semiconductor manufacturing efficiency and have been recognized with the 2012 ENIAC JU INNOVATION AWARD at the European Nanoelectronics Forum.
CIC nanoGUNE gathered over 70 international experts in lithography between the 13 and 15 November during the Nanolito 2012 workshop held at the centre’s installation in San Sebastián.
Advantest Corporation today announced that it has developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing and classifying ultra-small defects in photomask blanks.
Advantest Corporation (TSE: 6857, NYSE: ATE) today announced that it has developed a new EB (electron beam) lithography system, the F7000, with superior resolution performance meeting the requirements for 1Xnm technology nodes. The F7000 supports substrates of diverse materials, sizes, and shapes, including nanoimprint templates as well as wafers, and is optimized for diverse applications such as advanced LSIs, photonics, MEMS, and other nano-processes.
Terms
While we only use edited and approved content for Azthena
answers, it may on occasions provide incorrect responses.
Please confirm any data provided with the related suppliers or
authors. We do not provide medical advice, if you search for
medical information you must always consult a medical
professional before acting on any information provided.
Your questions, but not your email details will be shared with
OpenAI and retained for 30 days in accordance with their
privacy principles.
Please do not ask questions that use sensitive or confidential
information.
Read the full Terms & Conditions.