Nanolithography News

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TSMC Commits to ASML’s Customer Co-Investment Program for Innovation

ASML, the Netherlands-based provider of lithography systems for semiconductor manufacturers, has announced that TSMC has committed to ASML’s Customer Co-Investment Program for innovation with a promised investment of EUR 276 million towards research and development initiatives in the field of lithography spread over a five year period. TSMC will also be subscribing to a 5% equity stake in ASML which is valued at EUR 838 million.

7 Aug 2012

SRC Research Paves Way for 14 nm Circuits Using Directed Self Assembly

Directed Self Assembly technique that was previously used only in laboratories for test circuit structures has been successfully extended to real circuits of 22 nm by researchers at the Stanford University.

28 May 2012

Thin-Film Bio-Copolymer Raises Physical Limit to Microprocessor Performance

The development of a new copolymer, combining sugar-based with oil-based macromolecules, makes it possible to design ultra-thin films capable of self-organization on a scale of just 5 nm. This opens up new horizons for increasing the capacity of hard discs and the speed of microprocessors.

13 May 2012

Fraunhofer Researchers Develop Key Components for EUV Lithography

Researchers at three Fraunhofer Institutes have devised key components for EUV lithography.

From Fraunhofer Institute for Microelectronic Circuits and Systems 11 May 2012

ITME Purchases Vistec’s Advanced Electron-Beam Lithography System

Institute of Electronic Materials Technology (ITME) based in Warsaw has bought the SB251, a variable shaped beam system from Vistec Electron Beam, a provider of electron-beam lithography systems.

From Vistec Electron Beam 30 Apr 2012

SEMATECH EMI Partnership Members Place Orders for Carl Zeiss’ AIMS EUV Tools

In accordance with their slot assignments, two member companies of the SEMATECH EMI Partnership comprising TSMC, Samsung Electronics, Intel and GLOBALFOUNDRIES have placed orders to buy AIMS EUV tool, an actinic aerial image metrology solution from Carl Zeiss Semiconductor Metrology Systems (SMS) Division.

From Carl Zeiss Microscopy GmbH 27 Apr 2012

Synthetic Ligands Connect Nanocrystals for Current Transmission

University of Southern California (USC) scientists have developed a method to produce stable, low-cost solar cells from nanocrystals. These cells can be printed or painted onto surfaces as they are in the form of a liquid ink. These solar nanocrystals can float in a liquid solution and measure around 4 nm.

27 Apr 2012

Chalmers Awarded Funding for New Nanolithography Equipment

The Knut and Alice Wallenberg Foundation has provided over SEK 50 million to the Chalmers University of Technology. The Chalmers Nanofabrication Laboratory will use SEK 22 million to acquire new nanolithography equipment.

27 Apr 2012

SEMATECH, Inpria Partner to Tackle Key Challenges in EUV Lithography

Global consortium of chip manufacturers, SEMATECH has reported that Inpria, a specialist in chemical materials for superior performance oxide thin film deposition, has become a member of SEMATECH's Resist Materials and Development Center (RMDC) at the University at Albany's College of Nanoscale Science and Engineering (CNSE).

25 Apr 2012

NAPANIL Project Presents Latest Nanoimprinting Lithography Applications at Photonics Europe

A European project titled Nanopatterning, Production and Applications based on Nanoimprinting Lithography (NAPANIL) has delivered presentations on its final results at Photonics Europe held from April 16 to 18, 2012 in Brussels.

23 Apr 2012