Nanolithography News

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Scientists Create Complex 3-D Structures by Combining Ion Processing and Nanolithography

The fabrication of many objects, machines, and devices around us rely on the controlled deformation of metals by industrial processes such as bending, shearing, and stamping. Is this technology transferrable to nanoscale? Can we build similarly complex devices and machines with very small dimensions?

20 Oct 2012

Successful Commercial Metallization of Optical Images Using Nanotechnology

Nanotech Security (NTS) reports successful commercial metallization of optical images using nanotechnology. The company produces advanced authentication and security features utilizing nanotechnology-based optics.

25 Sep 2012

Energetiq Technology Completes Product Release Program for EQ-10HP 20-Watt EUV Light Source

Energetiq Technology, a company that develops and produces specialized ultrahigh-brightness light sources for sophisticated technology applications, has announced the completion of its product introduction program for a new 20 W EUV light source called the EQ-10HP.

From Energetiq Technology 25 Sep 2012

SK hynix Partners with SEMATCEH for EUVL Mask Infrastructure Development

SK hynix, a global supplier of memory devices including flash memory chips and dynamic random access memory chips (DRAMs), has entered into the extreme ultraviolet lithography (EUVL) mask infrastructure (EMI) partnership of SEMATECH based at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

21 Sep 2012

Carl Zeiss Microscopy Launches Orion NanoFab Multi-Ion Beam Tool at EMC

Carl Zeiss Microscopy introduced the ORION NanoFab at the European Microscopy Congress (EMC) in Manchester, UK. It is the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology, offering interchangeable gallium, neon and helium ion beams.

From Carl Zeiss Microscopy GmbH 17 Sep 2012

TSMC Certifies Mentor's Calibre LFD Product for Its 20nm Process

The Taiwan Semiconductor Manufacturing Company (TSMC) has certified the Calibre Litho Friendly Design (LFD) signoff lithography checking tool developed by Mentor Graphics for verification of its 20 nm integrated circuits manufacturing process.

14 Sep 2012

EUV Litho Honors EUV Technology with 'Outstanding Contribution Award'

EUV Litho honored EUV Technologies with the ‘Outstanding Contribution Award' at the International Workshop on Extreme Ultraviolet (EUV) Lithography 2012 hosted by EUV Litho.

13 Sep 2012

Enzymes Used to Etch Nanoscale Surface Structures

While two-dimensional patterns can be recreated fairly well with techniques like microlithography, three-dimensional structures represent a big challenge. In the journal Angewandte Chemie, American researchers have now reported a new method for the lithography-free etching of complex surface motifs with the use of biodegradable polymers and enzymes.

10 Sep 2012

New Nanolithography Technique for Potential Biomedical Applications

A new, less expensive nanolithography technique has been developed by researchers at the North Carolina State University (NCSU).

From North Carolina State University 1 Sep 2012

TSMC Commits to ASML’s Customer Co-Investment Program for Innovation

ASML, the Netherlands-based provider of lithography systems for semiconductor manufacturers, has announced that TSMC has committed to ASML’s Customer Co-Investment Program for innovation with a promised investment of EUR 276 million towards research and development initiatives in the field of lithography spread over a five year period. TSMC will also be subscribing to a 5% equity stake in ASML which is valued at EUR 838 million.

7 Aug 2012