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JSR's Collaboration with SEMATECH Helps to Drive Nanoelectronics Innovations

SEMATECH, a global consortium of chipmakers, and JSR Corporation, an advanced materials supplier to chip-makers and others, and its U.S. operation, JSR Micro, Inc. announced today that it has become the newest member of SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

12 May 2010

New Laser Interference Lithography Helps to Fabricate 2D and 3D Nano-Structures

European Research Team Leads with New Nano-fabrication Breakthroughs Two important breakthroughs by European researchers have brought an emerging nano-scale fabrication technology out of the lab an...

7 May 2010

SEMATECH Announces Leading Semiconductor Executives Join Speaker Lineup at Lithography Conference

With the aim of bringing together visionary leadership to garner the support of industry stakeholders on next-generation lithography technologies, SEMATECH announced today that Gary Patton, vice president, of IBM Semiconductor Research and Development Center, and Suresh Venkatesan, vice president, Alliance Technology Development of GLOBALFOUNDRIES, have joined the slate of industry speakers at SEMATECH's Litho Forum.

3 May 2010

EUVA’s LPP Light Source Achieves Breakthrough 104W Power Output for EUV Lithography Tools

Technology consortium, the Extreme Ultraviolet Lithography System Development Association (EUVA), today announced that its extreme ultraviolet (EUV) light source has achieved a power output of 104 Watts at the inter...

27 Apr 2010

Latest Breakthroughs in DFEB Mask Technology to be Featured at Photomask Japan 2010

The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the lat...

16 Apr 2010

Chip Industry Leaders to Discuss Challenges in Advanced Lithography at Litho Forum

Rep. Paul Tonko (D-NY) and ranking leaders in the semiconductor industry - including Jim Clifford, senior vice president and general manager of operations at Qualcomm, and Dr. Jack Sun, vice president of research and development at TSMC - will focus on economic challenges in advanced lithography during the fourth biannual SEMATECH Litho Forum May 10-12 at the Marriott Marquis in New York, NY.

13 Apr 2010

HUST and Vistec Collaborate to Enhance Research and Education on Nanolithography

Vistec Lithography, B.V. is pleased to announce today that it signed a strategic partnership agreement with the College of Optoelectronic Science and Engineering at the Huazhong University of Science and Technology in Wuhan, PR of China.

13 Apr 2010

Maskless Lithography Announces New MLI-2027 Direct-Write Lithography Tool

Maskless Lithography, Inc., a Silicon Valley startup led by a group of industry veterans, today came out of stealth mode with a brand new direct-write digital imaging technology that will raise the bar in printed circuit board (PCB) production. The new MLI-2027 direct-write lithography system is the industry's first to combine high throughput and yield with unparalleled accuracy using standard "Non-LDI" resists.

7 Apr 2010

Hybrid Metrology Project Leads Way to Reduce Measurement Uncertainty in Sub-28nm Nodes

CEA-Leti, a leading global research center committed to creating and commercializing innovation in micro- and nanotechnologies, said today that its Hybrid Metrology Project has developed a way to reduce measurement uncertainty in the sub-28nm nodes.

1 Apr 2010

Renesas Employs Proteus OPC to Develop 28-nm Node for Photon-Based Lithography

Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced that Renesas Technology Corp., the world's No. 1 supplier of microcontrollers...

24 Mar 2010

Nanolithography News

JSR's Collaboration with SEMATECH Helps to Drive Nanoelectronics Innovations

New Laser Interference Lithography Helps to Fabricate 2D and 3D Nano-Structures

SEMATECH Announces Leading Semiconductor Executives Join Speaker Lineup at Lithography Conference

EUVA’s LPP Light Source Achieves Breakthrough 104W Power Output for EUV Lithography Tools

Latest Breakthroughs in DFEB Mask Technology to be Featured at Photomask Japan 2010

Chip Industry Leaders to Discuss Challenges in Advanced Lithography at Litho Forum

HUST and Vistec Collaborate to Enhance Research and Education on Nanolithography

Maskless Lithography Announces New MLI-2027 Direct-Write Lithography Tool

Hybrid Metrology Project Leads Way to Reduce Measurement Uncertainty in Sub-28nm Nodes

Renesas Employs Proteus OPC to Develop 28-nm Node for Photon-Based Lithography

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

Study Shows Potential for New Treatments for Neurological and Inflammatory Diseases

Gold Nanoparticles to Restore Vision in Retinal Disorders

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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