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Quickparts Introduces High-Performance Stereolithography Material

Quickparts, one of North America's largest providers of custom designed parts, ranging from rapid prototyping to plastic injection molding, today announced the availability of Bluestone, a high-performance stereolithography material for rapid prototyping.

18 Mar 2010

MIT Researchers Use Electron-Beam Lithography to Create Patterns on Silicon Chips

Molecules that arrange themselves into predictable patterns on silicon chips could lead to microprocessors with much smaller circuit elements.

17 Mar 2010

SUSS MicroTec Receives Orders for 300mm Lithography Systems

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry, has received orders for multiple 300mm lithography systems from Amkor Technology Inc., an industry leading supplier of innovative packaging solutions.

From SUSS MicroTec AG 10 Mar 2010

Nanotechnology Researchers at Yale to get Vistec Electron Beam Lithography System

Vistec Lithography, Inc. announced today that Yale University, New Haven, Connecticut, selected Vistec's EBPG5000plus electron-beam lithography system for its future nanotechnology research programs. As part of the Y...

8 Mar 2010

Brewer's New Coating Offers Photoresist Compatibility, Tuned Optical Properties

Brewer Science, the leading supplier of advanced lithography materials, is pleased to launch ARC®29L coating, a state-of-the-art ArF immersion bottom anti-reflective coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a dual-layer BARC stack or as a single layer BARC on SiON.

From Brewer Science Inc. - Specialty Materials 26 Feb 2010

Brewer Science Unveils DBARC for KrF Photolithographer

Brewer Science, Inc., a leading supplier of advanced lithography materials, has released ARC® DS-K101P developer-soluble bottom anti-reflective coating (DBARC). This DBARC product has been formulated to meet the nee...

From Brewer Science Inc. - Specialty Materials 26 Feb 2010

Newly Built Wear-Resistant Nano-Sized Carbon Tip for Microscopy Applications

Researchers at the University of Pennsylvania, the University of Wisconsin-Madison and IBM Research-Zürich have fabricated an ultra sharp, diamond-like carbon tip possessing such high strength that it is 3,000 times more wear-resistant at the nanoscale than silicon

26 Feb 2010

Global Relationship Underscores TSMC's Participation in Euro Tech Development

Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) and MAPPER Lithography today revealed that a pre-alpha MAPPER tool located on TSMC's Fab 12 GigaFab™ is repeatedly printing features previously...

From TSMC Taiwan Semiconductor Manufacturing Company 19 Feb 2010

Obducat Receives Order for NIL system from Hamamatsu Photonics

Hamamatsu Photonics, the world leading manufacturer of opto-electronic devices and measurement instruments, has placed an order for an Obducat NIL system with Canon Marketing Japan. Hamamatsu Photonics provide academic ...

From Hamamatsu Photonics Europe 10 Feb 2010

Novel Nanoimprint Lithography Capable of Precise Nanostructured Devices

Nanoimprinting is an emerging technology that’s been used to produce various electronic and optical devices by imprinting the pattern from a mold onto a surface. But Dr. Hu’s team is exploring how the thermal imprinting can not only impart a pattern to the solar cell material but also change properties of the material in ways that maximize light absorption, increasing the efficiency of the resulting cells well beyond what anyone has done to date with these so-called organic solar cells.

6 Oct 2009