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Chip Industry Leaders to Discuss Challenges in Advanced Lithography at Litho Forum

Rep. Paul Tonko (D-NY) and ranking leaders in the semiconductor industry - including Jim Clifford, senior vice president and general manager of operations at Qualcomm, and Dr. Jack Sun, vice president of research and development at TSMC - will focus on economic challenges in advanced lithography during the fourth biannual SEMATECH Litho Forum May 10-12 at the Marriott Marquis in New York, NY.

13 Apr 2010

HUST and Vistec Collaborate to Enhance Research and Education on Nanolithography

Vistec Lithography, B.V. is pleased to announce today that it signed a strategic partnership agreement with the College of Optoelectronic Science and Engineering at the Huazhong University of Science and Technology in Wuhan, PR of China.

13 Apr 2010

Maskless Lithography Announces New MLI-2027 Direct-Write Lithography Tool

Maskless Lithography, Inc., a Silicon Valley startup led by a group of industry veterans, today came out of stealth mode with a brand new direct-write digital imaging technology that will raise the bar in printed circuit board (PCB) production. The new MLI-2027 direct-write lithography system is the industry's first to combine high throughput and yield with unparalleled accuracy using standard "Non-LDI" resists.

7 Apr 2010

Hybrid Metrology Project Leads Way to Reduce Measurement Uncertainty in Sub-28nm Nodes

CEA-Leti, a leading global research center committed to creating and commercializing innovation in micro- and nanotechnologies, said today that its Hybrid Metrology Project has developed a way to reduce measurement uncertainty in the sub-28nm nodes.

1 Apr 2010

Renesas Employs Proteus OPC to Develop 28-nm Node for Photon-Based Lithography

Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced that Renesas Technology Corp., the world's No. 1 supplier of microcontrollers...

24 Mar 2010

Quickparts Introduces High-Performance Stereolithography Material

Quickparts, one of North America's largest providers of custom designed parts, ranging from rapid prototyping to plastic injection molding, today announced the availability of Bluestone, a high-performance stereolithography material for rapid prototyping.

18 Mar 2010

MIT Researchers Use Electron-Beam Lithography to Create Patterns on Silicon Chips

Molecules that arrange themselves into predictable patterns on silicon chips could lead to microprocessors with much smaller circuit elements.

17 Mar 2010

SUSS MicroTec Receives Orders for 300mm Lithography Systems

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry, has received orders for multiple 300mm lithography systems from Amkor Technology Inc., an industry leading supplier of innovative packaging solutions.

From SUSS MicroTec AG 10 Mar 2010

Nanotechnology Researchers at Yale to get Vistec Electron Beam Lithography System

Vistec Lithography, Inc. announced today that Yale University, New Haven, Connecticut, selected Vistec's EBPG5000plus electron-beam lithography system for its future nanotechnology research programs. As part of the Y...

8 Mar 2010

Brewer's New Coating Offers Photoresist Compatibility, Tuned Optical Properties

Brewer Science, the leading supplier of advanced lithography materials, is pleased to launch ARC®29L coating, a state-of-the-art ArF immersion bottom anti-reflective coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a dual-layer BARC stack or as a single layer BARC on SiON.

From Brewer Science Inc. - Specialty Materials 26 Feb 2010

Nanolithography News

Chip Industry Leaders to Discuss Challenges in Advanced Lithography at Litho Forum

HUST and Vistec Collaborate to Enhance Research and Education on Nanolithography

Maskless Lithography Announces New MLI-2027 Direct-Write Lithography Tool

Hybrid Metrology Project Leads Way to Reduce Measurement Uncertainty in Sub-28nm Nodes

Renesas Employs Proteus OPC to Develop 28-nm Node for Photon-Based Lithography

Quickparts Introduces High-Performance Stereolithography Material

MIT Researchers Use Electron-Beam Lithography to Create Patterns on Silicon Chips

SUSS MicroTec Receives Orders for 300mm Lithography Systems

Nanotechnology Researchers at Yale to get Vistec Electron Beam Lithography System

Brewer's New Coating Offers Photoresist Compatibility, Tuned Optical Properties

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Harnessing Biology for Sustainable Energy Production

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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