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Heidelberg Announce Development of Advanced MOEMS with Chinese Counterpart

Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Zhejiang Normal University, located in Jinhau, China. System will be used in fabrication of Micro Optical Electro Mechanical Devices, as well as photomask production.

14 Dec 2008

Nanoscale Process with Sizable Potential in Areas from Nanotechnology to Information Storage

People said it couldn't be done, but researchers from the University of Pittsburgh and the U.S. Department of Energy National Energy Technology Laboratory (NETL) in Pittsburgh demonstrated a molecular chain reaction ...

11 Dec 2008

Molecular Imprints Announces Next Phase of its Ongoing S-FIL Adoption and Education Campaign

Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced the next phase of its ongoing S-FIL® (Step and Flash® Imprint Lithography) adoption and education...

10 Dec 2008

PI Receives U.S. Patent for its Development of Innovative Multilayer Ceramic Actuators

PI's exclusive PICMA® piezo-ceramic actuators are based on the novel stress reduction and encapsulation technologies which increase lifetime by several orders of magnitude both in static and dynamic applications, addressing key lifetime mechanisms common to other piezoelectric actuators.

10 Dec 2008

Intel Completes Next Generation 32 Nanometer Process Development Phase

Intel Corporation has completed the development phase of its next-generation manufacturing process that further shrinks chip circuitry to 32 nanometers (a billionth of a meter). The company is on track for production rea...

10 Dec 2008

New Record for Quantum Memory Storage - 7 Milliseconds for Rubidium Atoms Stored in a Dipole Optical Trap

Physicists have taken a significant step toward creation of quantum networks by establishing a new record for the length of time that quantum information can be stored in and retrieved from an ensemble of very cold atoms. Though the information remains usable for just milliseconds, even that short lifetime should be enough to allow transmission of data from one quantum repeater to another on an optical network.

7 Dec 2008

Nanometrics Announces the Launch of its Caliper InSight

Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced process control metrology equipment, today announced the launch of its Caliper InSight, a turnkey, image-based overlay metrology solution for advance...

3 Dec 2008

System Enables Chip Manufacturers to Shrink Feature Sizes to 32 Nanometers and Beyond

ASML Holding NV (ASML) (NASDAQ:ASML) (Amsterdam:ASML) today announces at SEMICON Japan the first system based on its new NXT lithography platform. The TWINSCAN™ NXT:1950i provides the increased productivity and ext...

2 Dec 2008

Combining Computational and Wafer Lithography to Improve Semiconductor Manufacturability

ASML (NASDAQ:ASML)(Amsterdam:ASML) and its subsidiary Brion Technologies today announce LithoTuner™, a new suite of products that integrates computational and wafer lithography to improve semiconductor manufacturab...

2 Dec 2008

EV Group Introduces New Suite of Aligners and Measurement Systems for the MEMS, Nanotechnology and Semiconductor Markets

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the NT series -- a new, yet already field-proven suite of mask aligners, wafer-to-wafer (W2W) bond aligners and measurement systems -- to address increased demand for higher precision alignment accuracy.

From EV Group 1 Dec 2008

Nanolithography News

Heidelberg Announce Development of Advanced MOEMS with Chinese Counterpart

Nanoscale Process with Sizable Potential in Areas from Nanotechnology to Information Storage

Molecular Imprints Announces Next Phase of its Ongoing S-FIL Adoption and Education Campaign

PI Receives U.S. Patent for its Development of Innovative Multilayer Ceramic Actuators

Intel Completes Next Generation 32 Nanometer Process Development Phase

New Record for Quantum Memory Storage - 7 Milliseconds for Rubidium Atoms Stored in a Dipole Optical Trap

Nanometrics Announces the Launch of its Caliper InSight

System Enables Chip Manufacturers to Shrink Feature Sizes to 32 Nanometers and Beyond

Combining Computational and Wafer Lithography to Improve Semiconductor Manufacturability

EV Group Introduces New Suite of Aligners and Measurement Systems for the MEMS, Nanotechnology and Semiconductor Markets

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Harnessing Biology for Sustainable Energy Production

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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