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Nanoscientist Mass-Produced 2500 Olympics Logo on Grain of Rice

Northwestern University nanoscientist Chad A. Mirkin has mass-produced the 2008 Summer Olympics logo -- 15,000 times. All the logos take up only one square centimeter of space.

15 Aug 2008

Paving the Way to Smaller Electronic Devices and Higher-Capacity Hard Drives

A new manufacturing approach holds the potential to overcome the technological limitations currently facing the microelectronics and data-storage industries, paving the way to smaller electronic devices and higher-capaci...

15 Aug 2008

Manufacturer Utilizes Imprio HD2200 Nanopatterning System to Accelerate Patterned Media Efforts

Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that Yamagata Fujitsu has placed an order for its newly introduced Imprio(R) HD2200. The system will be used for patterned media development at the company's manufacturing facility in Japan.

13 Aug 2008

SEMATECH Engineers and Resist Suppliers Demonstrate CAR Platforms that Support 22nm Half-Pitch

SEMATECH engineers, working closely with researchers from major resist suppliers, have demonstrated chemically amplified EUV resist (CAR) platforms that support 22 nm half-pitch resolution and are close to resolving sub-...

13 Aug 2008

Scientists Produced the Brightest, Sharpest X-Ray Holograms of Microscopic Objects Ever Made

The pinhole camera, a technique known since ancient times, has inspired a futuristic technology for lensless, three-dimensional imaging. Working at both the Advanced Light Source (ALS) at the U.S. Department of Energy's Lawrence Berkeley National Laboratory, and at FLASH, the free-electron laser in Hamburg, Germany, an international group of scientists has produced two of the brightest, sharpest x-ray holograms of microscopic objects ever made, thousands of times more efficiently than previous x-ray-holographic methods.

2 Aug 2008

Graphene Nanoribbons Hold Enormous Promise as Nanoscale Devices

Due to its remarkable electronic properties, few layer graphene, or FLG, has emerged as a promising new material for use in post-silicon devices that incorporate the quantum effects that emerge at the nanoscale. Now, phy...

31 Jul 2008

KLA-Tencor Acquires MIE Business Unit of Vistec Semiconductor Systems

KLA-Tencor today announced that it has entered into an agreement to acquire the Microelectronic Inspection Equipment (MIE) business unit of Vistec Semiconductor Systems, which is wholly owned by Golden Gate Capital, a Sa...

From Vistec Electron Beam 31 Jul 2008

Ultratech's AP300 Lithography Systems Enable Capacity Expansion of Customer's Facility in Asia

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices, today announced it received multiple orders from one of the largest memory manufacturers in the w...

30 Jul 2008

3D-TSV Wafers Account for More Than 6% of Total Semiconductor Industry by 2015

Research and Markets has announced the addition of the "3-D TSV Interconnects - Equipment + Materials 2008 Report" report to their offering. The Next Revolution for Semiconductor Packaging & Circuit Ass...

From Research and Markets 30 Jul 2008

One-Step Repeatable Method for Producing Functional Nanoscale Patterns

Scientists at the University of Pennsylvania have created a one-step, repeatable method for the production of functional nanoscale patterns or motifs with adjustable features, size and shape using a single master "p...

26 Jul 2008