At Semicon West 2008, SUSS MicroTec unveils the second generation of its MA300 Production Mask Aligner featuring a dedicated alignment kit for creating 3D interconnects for applications like chip stacking and 3D image sensor packaging. High alignment accuracy is required to enable 3D applications ranging from latest-generation mobile consumer electronics to supercomputers.
ASML Holding NV (ASML) announces today its newest TWINSCANTM XT:1950i lithography system using a 1.35 NA lens – increasing the performance of its immersion lithography systems by 25%. The system offers improved ove...
To meet the need for advanced micro-electromechanical systems (MEMS) tools, SVTC Technologies, a leading independent semiconductor process-development foundry, announced that it has expanded its capabilities to enable cu...
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Heptagon Micro-Optics Pte Ltd. in Singapore -- a wholly-owned sub...
IMEC, in collaboration with JSR Corporation, realized a simplified process using only one etch step to reduce the cost of double patterning. 32nm lines and spaces were printed with a double exposure/single etch process, effectively freezing the resist after the first exposure. This simplified process paves the way for an industrial take-up of double patterning for the 32nm technology node.
IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML's full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied Materials, using its most advanced deposition systems, was key to fabricating the ultra-small circuit structures.
A newly developed nano-sized electronic device is an important step toward helping astronomers see invisible light dating from the creation of the universe. This invisible light makes up 98% of the light emitted since the "big bang," and may provide insights into the earliest stages of star and galaxy formation almost 14 billion years ago.
EV Group (EVG), a leading supplier of wafer-bonding and lithography equipment for the advanced semiconductor and packaging, MEMS, silicon-on-insulator (SOI) and emerging nanotechnology markets, today announced it has rec...
MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over larger areas than have been possible with other methods.
SUSS MicroTec, supplier of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, announced today that it has shipped and successfully installed a Gamma coating cluster at Replisaurus Techn...
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