Nanooptics and Nanophotonics News

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Bringing Quantum Computing Closer to Reality

The new system, which can compute faster and more efficiently than previous quantum computers, may bring the technology closer to reality.

16 Jun 2010

Mediterranean Location Positions Nemotek as Newest Wafer-Level Fab

Nemotek Technologie, a manufacturer of customized Wafer-Level Cameras (WLCs), today announced that it is the newest wafer-level fab in the Mediterranean.

16 Jun 2010

New Dark Pulse Laser Generates Light Using Quantum Dots

In an advance that sounds almost Zen, researchers at the National Institute of Standards and Technology (NIST) and JILA, a joint institute of NIST and the University of Colorado at Boulder, have demonstrated a new type of pulsed laser that excels at not producing light.

From National Institute of Standards and Tech (NIST) 10 Jun 2010

New InGaAs Photodiodes Operating at 1550 nm Ideal for Military Applications

In military applications detection signals are typically very weak. Now that eye-safe pulsed laser diodes have just recently been introduced at 1550 nm for rangefinding applications, the appropriate detector will follow.

10 Jun 2010

ORECA01 Racing Car to Integrate Flexible OLED in Rear View Mirrors

In this year's 24 hours Le Mans race (June 12-13), the ORECA01 car from French racing team Oreca will be using rear view mirrors with an integrated Flexible Organic Light Emitting Diode (OLED) on the back. ...

10 Jun 2010

Renaissance to Display New Solia LED Luminaires Based on Nano-Phosphor Technology

Renaissance Lighting, a leading innovator in the development and manufacture of energy-efficient, ultra long-life solid-state luminaires, will exhibit at two nationally recognized industry conferences: the American Institute of Architects’ (AIA) National Convention, June 10-12, in Miami, and ArchLED ’10/NeoCon®, June 14-16 in Chicago.

9 Jun 2010

SUSS Launches New Dedicated Lithography Solution for HB-LED Production

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, today introduced the next generation of its MA100e mask aligner, a dedicated lithography solution for manufacturing high-brightness light emitting diodes (HB-LEDs).

From SUSS MicroTec AG 9 Jun 2010