Nanofabrication News

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Nanopatterning Solution Provider Receives Order for Multiple Imprint Modules

Molecular Imprints, a provider of high-resolution nanopatterning systems and solutions, has secured a purchase order from a major semiconductor equipment company to procure multiple imprint modules for integration into its stepper systems.

25 Sep 2012

SPTS Introduces Low-Temperature PECVD Solution for 3D-IC Packaging Applications

SPTS Technologies, the company that provides wafer processing solutions globally for semiconductor packaging, MEMS, power management device markets and such related markets, has introduced a low temperature plasma-enhanced chemical vapour deposition (PECVD) solution that addresses the issues in via-reveal passivation or post-through silicon via (TSV) processing in packaging of 3D integrated circuits.

21 Sep 2012

Carl Zeiss Microscopy Launches Orion NanoFab Multi-Ion Beam Tool at EMC

Carl Zeiss Microscopy introduced the ORION NanoFab at the European Microscopy Congress (EMC) in Manchester, UK. It is the first multi-ion-beam tool based on Gas Field Ion Source (GFIS) technology, offering interchangeable gallium, neon and helium ion beams.

From Carl Zeiss Microscopy GmbH 17 Sep 2012

Major Breakthrough in EUV Mask Blanks Defect Reduction with Veeco IBD System

SEMATECH, an international semiconductor association that endeavors to advance semiconductor chip manufacturing through research and development activities, recently reported a significant breakthrough in defect reduction from the multi-layer deposition technique adopted to process mask blanks that have applications in extreme ultra violet lithography (EUVL).

15 Sep 2012

Researchers Receive Grant to Develop Future Nanoelectronics

A consortium based in Tampere University of Technology (TUT) has received €1.6 million grant from the Academy of Finland under its ‘Programmable Materials’ funding scheme.

13 Sep 2012

Veeco Provides TurboDisc K465i MOCVD System for Nantong Tongfang’s R+D

Veeco Instruments, a provider of equipment solutions for production of wireless chips, MEMS, hard drives, power electronics and LEDs, has reported the delivery of its TurboDisc K465i MOCVD system to Nantong Tongfang Semiconductor’s new LED Technology Center located in Nantong, China.

11 Sep 2012

Enzymes Used to Etch Nanoscale Surface Structures

While two-dimensional patterns can be recreated fairly well with techniques like microlithography, three-dimensional structures represent a big challenge. In the journal Angewandte Chemie, American researchers have now reported a new method for the lithography-free etching of complex surface motifs with the use of biodegradable polymers and enzymes.

10 Sep 2012