Nanofabrication News

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Novel Wet-Etching Process for Producing High-Aspect-Ratio III-V Nanostructures

A research team led by Xiuling Li, who serves as a Professor of electrical and computer engineering at the University of Illinois at Urbana-Champaign, has developed a low-cost method to fabricate high-aspect-ratio, large-area III-V nanostructures for applications in advanced optoelectronic devices such as lasers and solar cells.

From University of Illinois at Urbana-Champaign 26 Dec 2011

New Partnership to Develop Ultra-Shallow Junctions for Producing Sub-14 nm Semiconductors

SEMATECH has inked a partnership deal with Dainippon Screen Mfg. to develop and commercialize sophisticated semiconductor doping technology for the sub-14 nm semiconductor production.

21 Dec 2011

Arradiance Signs Partnerships to Market GEMStar ALD Systems in Japan, Asia and Europe

Arradiance, a provider of functional film technologies and thin film process systems, has declared that Euris Semiconductor Services based in Grenoble, France has signed a partnership deal to sell and support Arradiance’s GEMStar benchtop atomic layer deposition (ALD) tools in Europe.

From Arradiance 17 Dec 2011

Fiberio Ship Continuous Nanofiber Production System to Kertak Nanotechnology

FibeRio Technology Corporation announced a shipment today of its new continuous nanofiber production system, the Cyclone FE 1.1, to Kertak Nanotechnology, a leading manufacturer of ceramic nanofibers.

12 Dec 2011

Machine Tool Measurement Systems with Nanometre Resolution

Fagor Automation, a subsidiary of the MONDRAGON Corporation that specialises in the manufacture of components for the general machine tools and automation sector, designs, manufactures and exports numerical control systems, position display units and high-precision encoders with nanometre-scale resolution.

11 Dec 2011

IMS Nanofabrication Signs Equity Funding Deal

IMS Nanofabrication, a provider of nanoscale direct-write and mask lithography imaging systems for semiconductor production, has inked an equity funding deal with contribution from Photronics, Intel Capital and private investor groups for the commercialization of its electron multi-beam mask exposure tool (eMET) for mask writing applications at sub 22 nm.

From IMS Nanofabrication GmbH 9 Dec 2011

Aehr Test Systems Announces Supply of 100th Full-Wafer Contactor

Aehr Test Systems, a provider of semiconductor burn-in and test equipment, has supplied its 100th full-wafer contactor for application in its Fox line of equipment used in wafer level burn-in and wafer sort test applications.

9 Dec 2011

Nanoscale Carving Technique to Synthesize Complex Hollow Nanostructures

The Catalan Institute of Nanotechnology scientists have developed a novel method based on the traditional corrosion techniques for the production of highly intricate hollow nanoparticles or cage-like nanostructures, which can be used for industrial processing and medical applications.

9 Dec 2011

Vapor Technologies Unveils Pure Black Low Temperature Arc Vapor Deposition Coating

Vapor Technologies, a provider of physical vapor deposition thin-film coating devices, has introduced a first-of-its-kind true black sophisticated low temperature arc vapor deposition (LTAVD) coating.

8 Dec 2011

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

USHIO has expanded its modular full-field projection lithography tool line called the UX4 Series with the launch of three new models, the UX4-ECO FFPL 150, the UX4-MEMS FFPL 200 and the UX4-3Di FFPL 300, for producing power devices, MEMS devices and three-dimensional LSI devices, respectively.

7 Dec 2011