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CEA-Leti Includes Synopsys in IMAGINE Program on Maskless Lithography

CEA-Leti has announced the inclusion of Synopsys as an industrial partner in the IMAGINE program designed for the development of maskless lithography for the production of integrated circuits (ICs).

From CEA-Leti 21 Sep 2011

New EUV Advanced Reticle Etch System Overcomes Hurdles Associated with EUV Lithography

Applied Materials, Inc. today advanced the state-of-the art in photomask technology with its new Applied Centura TetraTM EUV Advanced Reticle Etch system. Overcoming a major hurdle to the adoption of EUV lithography, ...

From Applied Materials Inc. 19 Sep 2011

Utilization of Water Vapor in Place of Ozone Increases Growth Rate of ALD Films

Steam purification company RASIRC has declared that it has presented a poster on the benefits of water vapor utilization over ozone in the atomic layer deposition (ALD) process at the 26th European Photovoltaic Solar Energy Conference and Exhibition conducted in Hamburg, Germany, from September 5 to 9, 2011.

17 Sep 2011

Patent Assets of Nanoelectronics Fabrication Sold by New Renaissance Institute

New Renaissance Institute, a Belmont, California-based for-profit interdisciplinary research and development organization, has declared that it has sold numerous molecular electronics patent assets, which cover important fields concerning the future of commercial carbon nanotube, graphene ribbon and semiconducting polymer nanoelectronics fabrication, to an undisclosed buyer in August 2011.

17 Sep 2011

Rice University Develops Nanocables Using Carbon Nanotubes

Rice University research team has developed a cable using double-walled carbon nanotubes. They have also demonstrated the cable’s conductivity by powering a fluorescent light bulb at normal line voltage.

9 Sep 2011

Tegal Declares Deadline to Submit Bids for its Portfolio of Nanolayer Deposition Patents

Tegal has announced that the deadline to submit bids for its nanolayer deposition technology (NLD) intellectual property portfolio is September 30, 2011. The deadline is subject to being withdrawn or extended.

From Collabrx, Inc. 8 Sep 2011

Novel Method to Fabricate Plasmonic Nanogap Arrays Quickly and Economically

A research team led by Dr. Stefan Strauf, who serves as Director of the NanoPhotonics Laboratory (NPL) at Stevens Institute of Technology, has devised a new method based on holographic lithography (HL) for producing evenly placed metallic nanostructures.

8 Sep 2011

Chinese Chip Design Firms Increase Investments in Advanced 28 nm Technology

The 10th annual IC Design House Survey of EE Times-China, eMedia Asia’s design engineering journal, has revealed that major IC design companies in Mainland China are using advanced 28 nm technology for chip development, while 9.2% of local fabless manufacturers have adopted ≤ 45 nm process technologies for the mass production of digital ICs.

7 Sep 2011

Nanometric Film Developer Unveils Advanced Film-Deposition Technology

Alchimer, a developer of processes and chemical formulations for the deposition of nanometric films for MEMS and microelectronic applications, has introduced an advanced film-deposition technology called the AquiVia TSV for through-silicon via (TSV) barrier-layer process.

7 Sep 2011

Tufts University Researchers Develop Electric Motor from Single Molecule

Scientists at the School of Arts and Sciences at Tufts University have devised a single molecule electrically-driven motor, first-of-its-kind device with a size of only 1 nm diagonally.

6 Sep 2011