Nanofabrication News

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New Technique for Fabricating Flexible Polymer Membranes with Subnanometer Channels

New Technique for Fabricating Flexible Polymer Membranes with Subnanometer Channels

Many futurists envision a world in which polymer membranes with molecular-sized channels are used to capture carbon, produce solar-based fuels, or desalinating sea water, among many other functions.

From Lawrence Berkeley National Laboratory 13 Jan 2011

New Laser Spike Annealing System from Ultratech Ideal for 28 nm Applications

New Laser Spike Annealing System from Ultratech Ideal for 28 nm Applications

Ultratech, Inc. a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced the release of its new field-tested LSA101 laser spike annealing (LSA) system, which enables critical millisecond annealing applications for the 28-nm node and beyond.

12 Jan 2011

Cornell’s NanoScale Facility Partners with SUSS MicroTec

Cornell’s NanoScale Facility Partners with SUSS MicroTec

SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets, announced a strategic collaboration with the Cornell NanoScale Science & Technology Facility (CNF), a university nanofab based in North America.

From SUSS MicroTec AG 12 Jan 2011

Global Comprehensive Report on Thin Film Deposition Equipment Market

Thin Film Deposition (TFD) equipment market, like any other manufacturing equipment industry, has been posting uneven performances, largely tied to the economic fortunes of the world. Demand for TFD equipment is deriv...

From Global Industry Analysts 12 Jan 2011

New Brochures on Mass Spectrometers for Vaccum Applications from Hiden

New Brochures on Mass Spectrometers for Vaccum Applications from Hiden

Hiden Analytical release a new brochure detailing their range of mass spectrometer products specifically developed for specialised vacuum process applications under diverse pressure regimes from sub-atmospheric to ultra-high vacuum.

From Hiden Analytical 11 Jan 2011

SEMATECH, NCI Collaborate to Develop Extreme Ultraviolet Lithography Technology

SEMATECH, a global consortium of chipmakers, and Nissan Chemical Industries, Ltd., (NCI) a Japanese chemical company supplying cutting-edge products in fields including electronic materials, today announced it has joined...

11 Jan 2011

ASU to Host Nanotechnology Symposium at Biodesign Institute

ASU to Host Nanotechnology Symposium at Biodesign Institute

Arizona State University will host a premier nanotechnology symposium titled “Organic/Inorganic Interfaces and Health Science Applications” at the Biodesign Institute on Jan. 13-14.

From Arizona State University 10 Jan 2011

New Coating Strategy Simplifies DNA Microarray Technique

Simple and universal DNA immobilization on surfaces with synthetical mussel polymer. Mussels are true masters of adhesion. Whether on the wood of a pier, the metal of a ship’s hull, rocks, or to their own kind, ...

7 Jan 2011

ISMI, Oxford Instruments Join for Coating 450 mm Silicon Wafers with PECVD SiO2 Films

ISMI, Oxford Instruments Join for Coating 450 mm Silicon Wafers with PECVD SiO2 Films

In collaboration with ISMI, the technology and applications teams at Oxford Instruments Plasma Technology have coated 450mm silicon wafers with PECVD SiO2 – a world first. The wafers were processed using the recen...

From Oxford Instruments Plasma Technology 6 Jan 2011

Georgia Tech Professor Receives IEEE Fellow Status for Contribution in MEMS Technologies

Georgia Tech Professor Receives IEEE Fellow Status for Contribution in MEMS Technologies

Six Georgia Institute of Technology faculty members have been elevated to Fellow status by the Institute of Electrical and Electronics Engineers (IEEE), the world’s leading professional association for the advancement of technology.

From Georgia Institute of Technology 5 Jan 2011

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