Nanofabrication News

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Xilinx’s Virtex UltraScale 20nm FPGA Enables JDSU ONT 400G Ethernet Test Platform

Xilinx, Inc. today announced that its Virtex® UltraScale™ 20nm FPGA is enabling the JDSU ONT 400G Ethernet test platform. This new platform delivers 400G bandwidth and ensures precise analysis on a true packet-to-packet basis to support the needs and complexity of advanced 400G applications.

9 Apr 2015

Synopsys Offers Broad Portfolio of DesignWare PHY IP for TSMC's 16nm FinFET Plus Processes

Synopsys, Inc. today announced the availability of a broad portfolio of DesignWare® PHY IP for TSMC's 16-nanometer (nm) FinFET Plus (16FF+) processes, enabling designers to integrate required functionality in mobile and enterprise system-on-chips (SoCs) with less risk.

From Synopsys, Inc. 9 Apr 2015

PLDA Partners with GUC to Create PCIe 4.0 Complete Solution on TSMC 16nm FinFET Plus Process

PLDA, the industry leader in PCI Express® controller IP solutions has partnered with GUC, the Flexible ASIC Leader™, to create the fully-integrated complete PCIe Gen 4 solution for TSMC’s 16nm FinFET Plus (16FF+) process. The new PCIe Gen 4 IP can be licensed immediately by system-on-a-chip (SoC) and system companies, enabling solutions that satisfy the throughput, latency and power demands of PCIe 4.0 applications.

9 Apr 2015

OLED Encapsulation Company, PlasmaSi, Acquired by AIXTRON

AIXTRON SE, one of the world’s leading manufacturers of deposition systems for the semiconductor industry, today announced that it has acquired privately held Silicon Valley-based PlasmaSi, Inc. effective April 1, 2015. The purchase price may reach up to $16 million and will be paid in cash.

From AIXTRON SE 8 Apr 2015

Collective, Fast Diffusion Method to Grow Perfect, Tiny Metal Nanostructures

“The textbook said we should see slow, gradual and random. But what we saw? BOOM! Fast, explosive and organized!” said Michael Tringides, physicist at the U.S. Department of Energy’s Ames Laboratory and a professor of physics and astronomy at Iowa State University.

8 Apr 2015

Researchers Produce Nanowires Using Meniscus-Mask Lithography

Water is the key component in a Rice University process to reliably create patterns of metallic and semiconducting wires less than 10 nanometers wide.

8 Apr 2015

TSMC Certifies Cadence Digital and Custom/Analog Tools for 10nm FinFET DRM and SPICE Models

Cadence Design Systems, Inc. today announced that its digital and custom/analog tools have achieved certification from TSMC for its most current version of 10-nanometer (nm) FinFET Design Rule Manual (DRM) and SPICE models.

8 Apr 2015

ATopTech Continues Collaboration with TSMC to Certify Aprisa, Apogee Solutions for 10nm Process Technology

ATopTech, the leader in next generation physical design solutions, is collaborating with TSMC to certify Aprisa™ and Apogee™, ATopTech’s place and route solutions, for TSMC 10nm process technology.

8 Apr 2015

Mentor Graphics and TSMC Reach First Milestone in 10nm EDA Certification Collaboration

Mentor Graphics Corp. today announced that TSMC and Mentor Graphics have reached the first milestone of their collaboration on 10nm EDA certification. Calibre® physical verification and design for manufacturing (DFM) platform, and the Analog FastSPICE™ (AFS™) Circuit Verification Platform, including AFS Mega, are certified by TSMC based on the most current version of 10nm design rules and SPICE models.

8 Apr 2015

Lubricant Based on Nanoparticles and Ionic Liquids for Extreme Conditions

In the world of the tiny zebrafish, the predatory red tiger oscar is the stuff of nightmares. And while the species has no natural reason to fear robots, researchers at the NYU Polytechnic School of Engineering have published the first study showing that, in a side-by-side comparison, a robotic predator can spook zebrafish just as well as the real thing. Their results may help advance understanding of fear and anxiety in animal populations, including humans.

7 Apr 2015

Nanofabrication News

Xilinx’s Virtex UltraScale 20nm FPGA Enables JDSU ONT 400G Ethernet Test Platform

Synopsys Offers Broad Portfolio of DesignWare PHY IP for TSMC's 16nm FinFET Plus Processes

PLDA Partners with GUC to Create PCIe 4.0 Complete Solution on TSMC 16nm FinFET Plus Process

OLED Encapsulation Company, PlasmaSi, Acquired by AIXTRON

Collective, Fast Diffusion Method to Grow Perfect, Tiny Metal Nanostructures

Researchers Produce Nanowires Using Meniscus-Mask Lithography

TSMC Certifies Cadence Digital and Custom/Analog Tools for 10nm FinFET DRM and SPICE Models

ATopTech Continues Collaboration with TSMC to Certify Aprisa, Apogee Solutions for 10nm Process Technology

Mentor Graphics and TSMC Reach First Milestone in 10nm EDA Certification Collaboration

Lubricant Based on Nanoparticles and Ionic Liquids for Extreme Conditions

Nanopore-Based Sensor Enables Rapid and Precise Disease Diagnosis

Combining Nanofluids and Turbulators for Sustainable Energy

Multiscale Force Sensing with Photon-Avalanching Nanocrystals

Breakthrough in 2D Material Growth Opens Doors to Cleaner Energy and Next-Generation Technology

Enhancing Material Properties through Nanotube Encapsulation

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

Sponsored Content

Characterization of Active Pharmaceutical Ingredients, Injectables, and Proteins

The Future of Wound Care: Why Nanofibers are Key to Accelerated Healing

The Evolution of Lipid Nanoparticles

How Emulsion Electrospinning is Transforming Materials