Nanofabrication News

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Novel Research Leverages Complex Oxides to Manipulate Magnetic Domain Walls Within Semiconductor Memory Device Wires

University of California, Davis researchers sponsored by Semiconductor Research Corporation (SRC), the world’s leading university-research consortium for semiconductors and related technologies, are exploring new materials and device structures to develop next-generation memory technologies.

13 Aug 2014

Novel Eco-Friendly Method to Synthesize Polymer Nanoparticles for Organic-Based Solar Cells

A team of materials chemists, polymer scientists, device physicists and others at the University of Massachusetts Amherst today report a breakthrough technique for controlling molecular assembly of nanoparticles over multiple length scales that should allow faster, cheaper, more ecologically friendly manufacture of organic photovoltaics and other electronic devices. Details are in the current issue of Nano Letters.

13 Aug 2014

Intel Discloses Newest Microarchitecture Optimized with 14nm Manufacturing Process

Intel today disclosed details of its newest microarchitecture that is optimized with Intel’s industry-leading 14nm manufacturing process. Together these technologies will provide high-performance and low-power capabilities to serve a broad array of computing needs and products from the infrastructure of cloud computing and the Internet of Things to personal and mobile computing.

12 Aug 2014

Joint Patterning Center of Excellence Launched by SEMATECH and SUNY CNSE/SUNYIT

SEMATECH and the newly merged SUNY College of Nanoscale Science and Engineering (CNSE) / SUNY Institute of Technology (SUNYIT) announced today they have launched their joint Patterning Center of Excellence. The new Center will leverage the CNSE/SUNYIT lithography infrastructure which includes state-of-the-art film deposition and etch capability, leading-edge patterning systems and SEMATECH's Resist Materials Development Center's (RMDC) world class EUV imaging capabilities.

From College of Nanoscale Science and Engineering, University at Albany 11 Aug 2014

Pt/TiOx (5nm)/ZnO/n+-Si Structure Demonstrates Optimal Resistive Switching Characteristics

Resistance switching of random access memory has been widely explored due to its potential for replacement of ﬂash memory in the next-generation nonvolatile memory applications.

11 Aug 2014

UMC Licenses Cypress’s SONOS Embedded Flash Memory IP for 55-nm Process Technology Node

New Japan Radio Co., Ltd. (New JRC) and United Microelectronics Corporation ("UMC"), a leading global semiconductor foundry, today announced that the two companies have successfully collaborated to achieve high-volume manufacturing for NJR's MEMS (micro electro mechanical system) microphone products.

From United Microelectronics Corporation 7 Aug 2014

Department of Defense Accredits Novati’s Austin Wafer Fabrication Facility as Category 1A Trusted Foundry

Novati Technologies Inc. (“Novati”), a leading development center for high-performance photonics, MEMS, 2.5D/3D, III-V-on-Silicon and advanced nanotechnology products, today announced that its 68,000 sq. ft. wafer fabrication facility in Austin has been accredited by the Department of Defense (DoD) as a Category 1A Trusted Foundry.

7 Aug 2014

RFaxis to Unveil Family of Nano RF Front-Ends in 40nm CMOS Process

RFaxis, Inc., a leading fabless semiconductor company focused on developing innovative, next-generation RF solutions for the wireless connectivity and cellular mobility markets, today announced that it will be unveiling a family of Nano RF products code named "Nucleus”.

6 Aug 2014

SMIC's 55nm LL eFlash Platform-Based 55nm Smart Card Chip Launched by HED

Semiconductor Manufacturing International Corporation ("SMIC") and CEC Huada Electronic Design Co., Ltd. ("HED") jointly announced today that HED has launched China's first 55nm smart card chip based on SMIC's 55nm LL (low leakage) eFlash (embedded flash) platform.

From Semiconductor Manufacturing International Corporation (SMIC) 6 Aug 2014

Altera Releases Early Access Design Software for 14-nm FPGAs

Building on the success of early customer benchmarking results announced earlier this year, Altera Corporation today released early access design software for Stratix® 10 FPGAs and SoCs, the industry's first design software targeting 14-nm FPGAs.

5 Aug 2014

Nanofabrication News

Novel Research Leverages Complex Oxides to Manipulate Magnetic Domain Walls Within Semiconductor Memory Device Wires

Novel Eco-Friendly Method to Synthesize Polymer Nanoparticles for Organic-Based Solar Cells

Intel Discloses Newest Microarchitecture Optimized with 14nm Manufacturing Process

Joint Patterning Center of Excellence Launched by SEMATECH and SUNY CNSE/SUNYIT

Pt/TiOx (5nm)/ZnO/n+-Si Structure Demonstrates Optimal Resistive Switching Characteristics

UMC Licenses Cypress’s SONOS Embedded Flash Memory IP for 55-nm Process Technology Node

Department of Defense Accredits Novati’s Austin Wafer Fabrication Facility as Category 1A Trusted Foundry

RFaxis to Unveil Family of Nano RF Front-Ends in 40nm CMOS Process

SMIC's 55nm LL eFlash Platform-Based 55nm Smart Card Chip Launched by HED

Altera Releases Early Access Design Software for 14-nm FPGAs

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

Study Shows Potential for New Treatments for Neurological and Inflammatory Diseases

Gold Nanoparticles to Restore Vision in Retinal Disorders

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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