Nanofabrication News

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Integran’s Nanostructured Alloy for Copper-Beryllium Replacement Receives 2013 SERDP Award

Last week, we announced that Integran received an award from the DoD's SERDP office for our work on environmentally benign plating for toxic beryllium replacement, which is particularly interesting for high load bushings, like the all-Nanovate Metal Bushings shown here.

From Integran Technologies Inc. 24 Feb 2014

Altatech and HZB Partner to Develop Materials for High-Efficiency Solar Cells

Altatech, a subsidiary of Soitec, and Helmholtz-Zentrum Berlin für Materialien und Energie (HZB), a member of the Helmholtz Association of German Research Centres, have launched a collaborative partnership to research and develop materials for the next generation of high-efficiency solar cells, including new classes of materials and innovative device structures for photovoltaic and photocatalysis applications.

24 Feb 2014

Gentle Techniques Used to Create Nanocapacitors

Electronics are getting smaller all the time, but there's a limit to how tiny they can get with today's materials. Researchers now say, however, that they have developed a way to shrink capacitors — key components that store energy — even further, which could accelerate the development of more compact, high-performance next-gen devices. The study appears in the journal ACS Nano.

From American Chemical Society 21 Feb 2014

Toshiba Introduces Client SSDs Integrating NAND Chips Fabricated with 19nm Second-Generation Process Technology

Toshiba Corporation today announced the launch of the “HG6 series” of client SSDs integrating NAND chips fabricated with 19nm second-generation process technology. Shipping will start from March.

20 Feb 2014

Standard Chip-Making Processes Can Be Used to Fabricate Low Power Photonic Devices

The future of computing may lie not in electrons, but in photons – that is, in microprocessors that use light instead of electrical signals. But these so-called photonic devices are typically built using customized methods that make them difficult and expensive to manufacture.

20 Feb 2014

First 28-nm Flash Memory IP for Microcontrollers Developed using 28-nm Process Technology

Renesas Electronics Corporation (TSE: 6723), a premier provider of advanced semiconductor solutions, today announced that it has developed the industry's first 28-nanometer (nm) flash memory intellectual property (IP) for microcontrollers (MCUs) using a 28 nm process technology.

19 Feb 2014

GT Acquires Kyma’s PVD of Nano-Columns Technology

GT Advanced Technologies today announced that it has acquired exclusive rights from Kyma Technologies, Inc. for its plasma vapor deposition (PVD) process technology and know-how. The PVD of nano-columns (PVDNC™) technology developed by Kyma deposits a high-quality growth initiation layer of aluminum nitride (AlN) on wafers prior to gallium nitride (GaN) deposition.

19 Feb 2014

Glasgow's James Watt Nanofabrication Centre Builds Multi-Million Pound Deposition and Analysis Cluster with Oxford Instruments

Leaders in high technology systems Oxford Instruments have recently received a multi-million pound order for a complex deposition and analysis cluster system from the James Watt Nanofabrication Centre at the University of Glasgow.

From Oxford Instruments Plasma Technology 18 Feb 2014

Korean Memory Manufacturer Places Repeat Orders for AMEC’s Single-Station Chamber Advanced Dielectric Etch Tool

Advanced Micro-Fabrication Equipment Inc. (AMEC) said today that a leading Korean manufacturer of memory ICs has placed repeat orders for its Single-Station Chamber Advanced Dielectric Etch tool, the Primo SSC AD-RIE™.

13 Feb 2014

Researchers Develop Highly Transmissive Plasmonic Subtractive Color Filters Using Ultrathin Nanostructured Metals

TVs, image sensors, iPads, digital cameras and other modern devices use filters to display the breadth of colors available in the visible portion of the electromagnetic spectrum.

11 Feb 2014

Nanofabrication News

Integran’s Nanostructured Alloy for Copper-Beryllium Replacement Receives 2013 SERDP Award

Altatech and HZB Partner to Develop Materials for High-Efficiency Solar Cells

Gentle Techniques Used to Create Nanocapacitors

Toshiba Introduces Client SSDs Integrating NAND Chips Fabricated with 19nm Second-Generation Process Technology

Standard Chip-Making Processes Can Be Used to Fabricate Low Power Photonic Devices

First 28-nm Flash Memory IP for Microcontrollers Developed using 28-nm Process Technology

GT Acquires Kyma’s PVD of Nano-Columns Technology

Glasgow's James Watt Nanofabrication Centre Builds Multi-Million Pound Deposition and Analysis Cluster with Oxford Instruments

Korean Memory Manufacturer Places Repeat Orders for AMEC’s Single-Station Chamber Advanced Dielectric Etch Tool

Researchers Develop Highly Transmissive Plasmonic Subtractive Color Filters Using Ultrathin Nanostructured Metals

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

Gold Nanoparticles to Restore Vision in Retinal Disorders

Light-Induced Symmetry Shifts Enable New Advances in Nanomaterials

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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