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Chinese Chip Design Firms Increase Investments in Advanced 28 nm Technology

The 10th annual IC Design House Survey of EE Times-China, eMedia Asia’s design engineering journal, has revealed that major IC design companies in Mainland China are using advanced 28 nm technology for chip development, while 9.2% of local fabless manufacturers have adopted ≤ 45 nm process technologies for the mass production of digital ICs.

7 Sep 2011

Lattice Offers 65 nm Process-Based MachXO2 PLD Series in Compact WLCSP Package

Lattice Semiconductor has started the shipment of samples of its MachXO2 PLD portfolio utilizing a 2.5 x 2.5 mm 25-ball wafer level chip scale package (WLCSP).

7 Sep 2011

Synopsys Extends Support for Achronix's 22 nm Speedster22i FPGA Platform

Synopsys and Achronix Semiconductor have declared a multi-year renewal of their OEM deal for Synopsys field-programmable gate array (FPGA) synthesis tools.

From Synopsys, Inc. 3 Sep 2011

New Manufacturing Technique Produces Chip Features As Small as 10nm

In a pair of recent papers, researchers at MIT’s Research Laboratory of Electronics and Singapore’s Engineering Agency for Science, Technology and Research (A*STAR) have demonstrated a new technique that could produce chip features only 10 nanometers.

From Massachusetts Institute of Technology 1 Sep 2011

Organic Semiconductor Study for Advancement of Flexible Electronics Field

Dr. Oana Jurchescu, who serves as assistant professor of physics at Wake Forest University, and her team have developed an exceptionally huge molecule with high stability and superior electrical properties at lower cost, which paves the way for the advancement of plastic-based flexible electronics field.

31 Aug 2011

GLOBALFOUNDRIES Announces Market Readiness of its 20 nm Production Process

GLOBALFOUNDRIES has showed that it is ready to evaluate its customers’ 20 nm designs by effectively taping out a test chip utilizing flows from major EDA vendors Synopsys, Mentor Graphics, Magma Design Automation and Cadence Design Systems.

From GlobalFoundries 31 Aug 2011

Epistar Qualify Veeco MOCVD System for High Volume HB-LED Manufacture

Veeco Instruments Inc. (Nasdaq: VECO) announced today that Epistar Corporation, headquartered in Taiwan, has recently qualified the TurboDisc(R) MaxBright(TM) gallium nitride (GaN) Multi-Reactor Metal Organic Chemical Va...

From Veeco 30 Aug 2011

GLOBALFOUNDRIES to Use Solido Variation Designer for its 28 nm AMS Reference Flow

GLOBALFOUNDRIES has chosen Solido Design Automation’s Solido Variation Designer, which includes PVT+ and High-Sigma Monte Carlo+ packages, for its 28 nm analog/mixed-signal (AMS) reference flow.

From GlobalFoundries 30 Aug 2011

Mentor Graphics Offers CMP Modules for 28 nm and Calibre LFD Kits for 20-28 nm

Mentor Graphics has introduced new functionalities in its design to silicon solutions, which include the enhanced CMP modules for 28 nm and new Calibre LFD kits for 20 and 28 nm, for GLOBALFOUNDRIES’ third-generation signoff-ready design enablement for advanced IC production.

30 Aug 2011

OSRAM Introduces Infrared LED with Nanostack Chip Technology

OSRAM Opto Semiconductors has introduced IR OSLON SFH 4715S, a compact infrared LED with nanostack chip technology. The IR LED provides optical power of over a Watt.

29 Aug 2011