Joint Development Research Focuses on 3D TSV Process Control

Rudolph Technologies, Inc. (NASDAQ: RTEC) and SEMATECH, the global consortium of leading chipmakers, announced today that Rudolph has joined SEMATECH's 3D Interconnect Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. The joint partnership is a continuation of collaborative efforts in process characterization, with a new focus on 3D IC (three-dimensional integrated circuits) processing and enhancing process control of TSV (through-silicon vias) manufacturing. This is the second year that Rudolph will serve as a Member of SEMATECH.

As a member of SEMATECH's 3D program, Rudolph's inspection and metrology technologies will be applied to various projects including via depth and CD metrology, metallization void detection, stacked wafer via alignment, wafer edge defect detection and bump height coplanarity.

"The advanced device design and complex manufacturing requirements of 3D packaging opens a new frontier of process control challenges. Rudolph is well positioned, both with existing and emerging technologies, to be the semiconductor industry's premier TSV process control solution provider," stated Ardy Johnson, Rudolph's vice president of marketing.

Sitaram Arkalgud, director of 3D interconnect at SEMATECH added, "We are pleased to welcome Rudolph as a partner. Rudolph's proven expertise in defect detection, characterization, and data analysis will be significant in developing technologies and processes that will continue to drive implementation of manufacturable and cost-effective 3D TSV processes."

Richard Brilla, vice president for strategy, alliances and consortia at CNSE, said, "The addition of Rudolph Technologies' innovative metrology and characterization capabilities will further enhance the leading-edge research being conducted as part of SEMATECH's 3D Interconnect Program at CNSE's Albany NanoTech. At the same time, it will build on the world-class research and development at the UAlbany NanoCollege, which is providing critical solutions for the world's leading companies in the highly competitive global nanoelectronics industry."

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Onto Innovation. (2019, February 14). Joint Development Research Focuses on 3D TSV Process Control. AZoNano. Retrieved on November 21, 2024 from https://www.azonano.com/news.aspx?newsID=10996.

  • MLA

    Onto Innovation. "Joint Development Research Focuses on 3D TSV Process Control". AZoNano. 21 November 2024. <https://www.azonano.com/news.aspx?newsID=10996>.

  • Chicago

    Onto Innovation. "Joint Development Research Focuses on 3D TSV Process Control". AZoNano. https://www.azonano.com/news.aspx?newsID=10996. (accessed November 21, 2024).

  • Harvard

    Onto Innovation. 2019. Joint Development Research Focuses on 3D TSV Process Control. AZoNano, viewed 21 November 2024, https://www.azonano.com/news.aspx?newsID=10996.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.