AIXTRON AG, a leading provider of deposition equipment to the semiconductor industry, announced today that Nagoya Institute of Technology in Nagoya, Japan, has ordered one Black Magic II CVD tool.
The order for the tool was received in the first quarter of 2009 and will be delivered in a 2 inch wafer configuration. It was shipped during Q1 and the system installation will be completed by the local AIXTRON support team in the university’s facility during Q2.
The Black Magic II, a combined thermal CVD and plasma enhanced CVD tool, will be used for the deposition of carbon nanotubes (CNTs) for the development of technologies for microelectronic devices such as heat sinks, via interconnects for future LSIs, field-effect transistors (FETs), biological sensors and other nanotechnology based components.
Associate Prof. Yasuhiko Hayashi, Nagoya Institute of Technology comments: “In our assessment the AIXTRON Black Magic II CNT system exactly matches our research aims. The development program for our heat sink, via interconnects, electronic components and sensor applications requires material growth that is well controlled vertically as well as being laterally aligned so as to create CNTs in selectively patterned areas at a high growth rate. I am sure that the tool will be of great benefit helping us produce useful structures quickly and efficiently.”
AIXTRON’s Black Magic II CVD (chemical vapor deposition) tool employs rapid heating and plasma technologies that have been proven in the field since 2005. With this system, customers are able to produce a range of different types of nanotubes, including low temperature, multiwall, single-wall and super-growth nanotubes. The tool has been designed to be easy to use for either laboratory or production facilities