Since its introduction earlier this year, the 35 nm half-pitch grating template has been used by many customers around the world and in collaborative projects of EULITHA.
SEM image of a nanoimprinted pattern in PMMA resist. Imprint performed on a Hex03 tool from Jenoptik (M. Altana, H. Schift, INKA).
The introductory standard template having a patterned area of 2.4 mm2 is popular with researchers in need of high resolution line structures or engaged in the development of nanoimprint processes. Large area custom made versions covering centimeter square areas are sought in studies in biology, and magnetic and optical properties of materials.
The Institute for Polymer Nanostructures (known with its German acronym - INKA) in Switzerland utilized the structures to test their Nanoimprint and Nano-injection molding processes. In another study the templates were recently used by the EV Group of Austria to demonstrate their process for producing low cost plastic replica templates. This joint work will be presented at the NNT conference later this fall in San Jose, California.
EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders have played critical roles in the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institut. The company aims to serve nano-structuring needs of targeted applications through this breakthrough technology. At present, it provides products as samples for nanotechnology R&D.