Sep 6 2010
MCA, a global high-tech communications agency, today announced it will be hosting its next online panel discussion in cooperation with SemiNeedle, dubbed the BrightSpots Lithography Forum, which will enable industry professionals to partake in an active discussion exploring the key issues surrounding the future of lithography.
On Tuesday, September 14, a live panel event, also available online, will be held during the SPIE/BACUS Photomask Technology Symposium and will kick off an online discussion forum that will begin the next day, September 15. The forum will feature the panelists from the live event engaging with the public in an online discussion that runs until September 24.
Moderating the forum will be Aaron Hand, industry expert and blogger. Panelists include industry leaders from throughout the lithography value chain:
- Paul W. Ackmann, Engineering Fellow, Advanced Reticles and Associated Technology Interaction, GLOBALFOUNDRIES
- Aki Fujimura, Chief Executive Officer, D2S
- Franklin Kalk, Chief Technology Officer, Toppan Photomask
- Mike Rieger, Group Director, Technology, Silicon Engineering Group, Synopsys
- Bob Socha, Fellow, Technology Development Center, ASML
The live panel will take place on Tuesday, September 14 at 5:15 p.m. Pacific Time. This event will be accessible online, allowing participants a unique opportunity to gain greater insight into the latest technology trends and developments in lithography, and pose questions directly to some of the foremost experts in the field.
Source: http://www.mcapr.com/