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Mentor Graphics Completes 28-nm Signoff-Ready Digital Design Flow

Mentor Graphics has declared the completion of its 28-nm signoff-ready digital design flow for the technology of GLOBALFOUNDRIES. The sign-off-ready design flow is created to meet the distinctive challenges of designing and producing integrated circuits at leading-edge nodes.

The Olympus-SoC place and route system comprises low-power capabilities, DFM support and enhanced methods for effective routing at 28 nm for the manufacturing scoring analysis technology (MAS) of the foundry. The Calibre platform offers sophisticated design matching technology that executes DRC+ methodology of GLOBALFOUNDRIES for eliminating litho hotspots, which is 100 times quicker than conventional flows.

The Calibre InRoute system offers the automated repair and Calibre signoff analysis incorporated in the Olympus-SoC physical design system. The flow also comprises the Calibre InRoute manufacturing closure platform which allows designers to invoke Calibre tools within the place and route system to attain accurate production closure during physical design. It offers customers GLOBALFOUNDRIES-certified DRC+ fixing, which executes correct-by-construction design by identifying and removing limited layout designs that may result in DFM/DRC violations.

Moreover in the DFM field, GLOBALFOUNDRIES has unveiled its MAS deck for the Calibre platform. It utilizes the distinctive Calibre equation-based DRC feature to rate the production capability of a layout utilizing a user-friendly metric.

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