New Report on Global e-Beam Wafer Inspection System Market

Research and Markets has announced the addition of the "Global e-Beam Wafer Inspection System Market, 2018: Market Shares & SWOT Analysis of Key Vendors" report to their offering.

Currently, e-beam wafer inspection systems are being used in wafer inspection processes. It is expected that the systems will also be employed for three-dimensional through-silicon via inspection and extreme ultraviolet mask inspection during the forecast period. Thus, the increasing number of applications for the e-beam wafer inspection systems will tend to increase the customer base, which in turn will increase demand in the market. This is one of the major trends which will influence the growth in the market during the forecast period.

According to the report, one of the main drivers in this market is the increasing penetration of inspection systems. E-beam wafer inspection systems are gaining popularity among semiconductor manufacturers because of their accuracy and flexibility.

Further, the report states that one of the key challenges in this market is the cyclical nature of the Semiconductor industry that leads to fluctuations in the demand for e-beam wafer inspection systems. Moreover, in some cases the production of such equipment tends to exceed its demand.

Market Shares and SWOT Analysis for these vendors:

  • Applied Materials Inc.
  • ASML Holding N.V.
  • Hermes Microvision Inc.
  • Hitachi High-Tech Corp.
  • KLA-Tencor Corp.
  • Lam Research Corp.

Key Topics Covered:

01. Executive Summary

02. List of Abbreviations

03. Scope of the Report

04. Market Research Methodology

05. Introduction

06. Market Landscape

07. Geographical Segmentation

08. Key Leading Countries

09. Buying Criteria

10. Market Growth Drivers

11. Drivers and their Impact

12. Market Challenges

13. Impact of Drivers and Challenges

14. Market Trends

15. Trends and their Impact

16. Vendor Landscape

17. Key Vendor Analysis

For more information visit http://www.researchandmarkets.com/research/n5v3cp/global_ebeam

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