Jan 30 2008
Surface Technology Systems plc (STS), a leader in plasma process technologies for manufacturing MEMS and advanced semiconductor devices, today announced that it has sold a "Pegasus" deep reactive ion etch (DRIE) tool to the Institut fur Mikroelektronik Stuttgart (IMS CHIPS). The etch tool will be used for a number of silicon etch applications including fabricating high aspect ratio nanostructures for replication masters.
IMS CHIPS is a foundation created in 1983 by the state of Baden- Wurttemberg in Germany, and is involved in industry-oriented research in silicon technology, application-specific integrated circuits (ASICs), photo lithography and image sensors as well as vocational education. The institute has alliances with small- and medium-scale companies and co-operates with top international semiconductor corporations and suppliers.
Dr. Florian Letzkus at IMS CHIPS said, "We have been using STS' ASE(R) equipment since 1999, and are very excited about the improved process capabilities of this latest product. Over the years, we have always been well supported by STS' customer service and this, combined with the superior process results demonstrated by the Pegasus, meant we had no hesitation in purchasing from them again."
Eizo Yasui, CEO of STS added, "We are very pleased with this new order from a long-standing customer and realize that our future success depends on maintaining both our technology lead in DRIE processing and our reputation for responding effectively to existing customer service needs. We are therefore committed to continued investment in new product development and our customer support infrastructure."