In Situ Measurement of Film Thickness and Composition Now Possible with ThinFilmID

Oxford Instruments NanoAnalysis introduces ThinFilmID for the in-situ measurement of composition and thickness of thin films down to 1nm in the SEM.

ThinFilmID uses Energy Dispersive X-ray Spectrometry (EDS) to measure the composition and thickness of layers in a thin film structure.

This technique has a unique combination of advantages that offer real benefits to customers both in terms of speed, optimisation of methods and ease of use. These benefits include:

• Spatially resolved measurements – analyse a specific point on a sample
• Excellent nano-scale lateral resolution – controlled by the interaction volume and only few hundred nm at low kV
• Measure the composition and /or thickness of the layers
• Measures layers as thin as 2nm and as thick as 1000nm
• Measure structures with up to 7 layers plus substrate with up to 16 elements.
• Unique Solvability and Simulation tool for simple optimization of data collection conditions
• Non-destructive technique with no need to cross-section structures
• Minimal sample preparation = time and cost savings
• Works with existing SEMs and INCAEnergy, no unique hardware is required

For more information on thin films click here.