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Remote Plasma Atomic Layer Deposition (ALD) Processes and Thermal ALD With The FlexALTM Atomic Layer Deposition (ALD) Tool From Oxford Instruments

Oxford Instruments’ FlexAL product family provides a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma Atomic Layer Deposition (ALD) processes and thermal ALD within a single system.

From Oxford Instruments plc 11 Oct 2006

In-situ Electrical Characterization During Nanoindentation of Crystalline Silicon using nanoECR and Hysitron TriboIndenter

This article discusses in-situ electrical characterization during nanoindentation of crystalline silicon using nanoECR and Hysitron TriboIndenter.

From Bruker Nano Surfaces and Metrology 5 Oct 2006

In-Situ Scanning Probe Microscopy (SPM) Imaging - Superior Nanomechanical Testing Results

In-situ SPM imaging provides high-resolution images at the point of the nanomechanical test by imaging with the same tip that is used to perform the testing. This provides crucial information that would be unavailable without the image resolution offered by in-situ imaging.

From Bruker Nano Surfaces and Metrology 29 Sep 2006

Dip Pen Nanolithography – A Modern Nanolithographic Technique Combining The Atomic Force Microscope With Old Fashioned Ink Pen Writing

Several lithographic techniques are used for patterning in the nanoscale region. Dip Pen Nanolithography combines cutting edge atomic level technologies with age old writing methods.

27 Sep 2006

Nanoimprint Lithography – A Nanolithographic Process For Producing Sub 10nm Features For a Range of Devices and Applications

Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features

27 Sep 2006

Scanning Probe Lithography (SPL) – A Basic Look At Using Scanning Probe Microscopes as a Tool In Next Generation Nanolithographic Techniques Including Applications and Resolution

Several lithographic techniques are used for patterning in the nanoscale region. The technique of Scanning Probe Lithography (SPL) uses the scanning tunneling microscope (STM) to produce nanometer-scale features on a sample

25 Sep 2006

Light Coupling Mask (LCM) Nanolithography - A Basic Look At The LCM NanoLithographic Technique and It’s Advantages

Several lithographic techniques are used for patterning in the nanoscale region. Light coupling mask (LCM) nanolithography is a variation on the commonly used technique of photolithography.

25 Sep 2006

Extreme Ultraviolet Lithography (EUVL) - A Basic Look At The NanoLithographic Technique Tipped To Produce Next Generation Computer Chips

Several lithographic techniques are used for patterning in the nanoscale region. Extreme ultraviolet lithography (EUVL) is an emerging contender for the replacement of optical photolithography in the production of computer chips.

25 Sep 2006

Establishment Of A Technique For Production Of High-Performance Thin Films With Laser Irradiation - Enabling The Provision Of The World's Highest Quality Superconducting Thin Films At A Low Price

AIST has obtained results which reverse the conventional wisdom that superconducting films formed by processes needing a vacuum atmosphere are of high performance but expensive, while superconducting thin films produced by solution processes are inexpensive but of low performance

22 Sep 2006

X-Ray Lithography – A Basic Look At The X-Ray Lithography NanoLithographic Technique, Applications and Resolution

Several lithographic techniques are used for patterning in the nanoscale region. This article examines X-Ray Lithography

21 Sep 2006

Latest Articles

Remote Plasma Atomic Layer Deposition (ALD) Processes and Thermal ALD With The FlexALTM Atomic Layer Deposition (ALD) Tool From Oxford Instruments

In-situ Electrical Characterization During Nanoindentation of Crystalline Silicon using nanoECR and Hysitron TriboIndenter

In-Situ Scanning Probe Microscopy (SPM) Imaging - Superior Nanomechanical Testing Results

Dip Pen Nanolithography – A Modern Nanolithographic Technique Combining The Atomic Force Microscope With Old Fashioned Ink Pen Writing

Nanoimprint Lithography – A Nanolithographic Process For Producing Sub 10nm Features For a Range of Devices and Applications

Scanning Probe Lithography (SPL) – A Basic Look At Using Scanning Probe Microscopes as a Tool In Next Generation Nanolithographic Techniques Including Applications and Resolution

Light Coupling Mask (LCM) Nanolithography - A Basic Look At The LCM NanoLithographic Technique and It’s Advantages

Extreme Ultraviolet Lithography (EUVL) - A Basic Look At The NanoLithographic Technique Tipped To Produce Next Generation Computer Chips

Establishment Of A Technique For Production Of High-Performance Thin Films With Laser Irradiation - Enabling The Provision Of The World's Highest Quality Superconducting Thin Films At A Low Price

X-Ray Lithography – A Basic Look At The X-Ray Lithography NanoLithographic Technique, Applications and Resolution

Gold Nanoparticles to Restore Vision in Retinal Disorders

Levidian and Zentek Seek to Establish Graphene-Integrated Filter Manufacturing Facility in the Middle East to Advance Cleaner, Safer Air

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

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