Nanoimprint Lithography – A Nanolithographic Process For Producing Sub 10nm Features For a Range of Devices and Applications

Sep 27 2006

Topics Covered

Background

Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features

Nanoimprint Lithography

Nanoimprint lithography is a simple process that uses a mould to emboss the resist with the required pattern. After embossing the resist, compressed resist material is removed using anisotropic etching and the substrate exposed. The main advantage of nanoimprint lithography is that it can produce features at extremely small resolutions that cover a large area with a high throughput and relatively low cost.

AZoNano - The A to Z of Nanotechnology - Schematic diagram of the steps involved in the nanoimprint lithographic process

Figure 1. Schematic diagram of the steps involved in the nanoimprint lithographic process

Resolution

Nanoimprint lithography can give resolutions lower than 10nm with high throughput and low cost.

Production Barriers

The current barrier to production at these resolutions is the development of the mould itself. Nanomanufacturing using self assembly may hold the solution to this hurdle.

Applications

Nanoimprint lithography is being used to make electrical, optical, photonic and biological devices. Advances in mould manufacturing will see nanoimprint lithography applied more widely to increasingly smaller devices.

Source: AZoNano

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