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Molecular Imprints Introduces New Jet and Flash Imprint Lithography Mask Replication Platform

Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 — its new Jet and Flash™ Imprint Lithography (J-FIL™) imprint mask replication platform for the semiconductor industry.

13 Jan 2011

Extensive Overview of Plasmons in Metallic Nanomaterials

Tadaaki Nagao at the International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS) and colleagues in Germany and Spain present a review on plasmons in metallic nanomaterials.

From National Institute for Materials Science 13 Jan 2011

New Laser Spike Annealing System from Ultratech Ideal for 28 nm Applications

Ultratech, Inc. a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced the release of its new field-tested LSA101 laser spike annealing (LSA) system, which enables critical millisecond annealing applications for the 28-nm node and beyond.

12 Jan 2011

Cornell’s NanoScale Facility Partners with SUSS MicroTec

SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets, announced a strategic collaboration with the Cornell NanoScale Science & Technology Facility (CNF), a university nanofab based in North America.

From SUSS MicroTec AG 12 Jan 2011

SEMATECH, NCI Collaborate to Develop Extreme Ultraviolet Lithography Technology

SEMATECH, a global consortium of chipmakers, and Nissan Chemical Industries, Ltd., (NCI) a Japanese chemical company supplying cutting-edge products in fields including electronic materials, today announced it has joined...

11 Jan 2011

Ultratech Launches Dual-Beam LSA100L System for Leading-Edge Logic Devices

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today introduced the LSA100L, a new dual-beam laser spike anneal (DB-LSA) system for leading-edge logic devices.

23 Dec 2010

Shrink Nanotechnologies and EV Group Sign Multi-Year Agreement

Shrink Nanotechnologies, Inc. ("Shrink") an innovative nanotechnology company developing products and licensing opportunities in the solar energy industry, medical diagnostics and sensors and biotechnology research and development tools businesses, announced today that it has entered into a multi-year development and manufacturing agreement with EV Group, a 30 year old Austria-based leader in the nano-imprint lithography process designing and equipment manufacturing.

8 Dec 2010

Lithography Systems Supplier Ultratech Opens New Manufacturing Unit in Singapore

Ultratech, Inc. a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today officially opened an advanced manufacturing facility in Singapore.

7 Dec 2010

SUSS MicroTec to Develop Nanostructuring Equipment with Rolith's Nanolithography Method

SUSS MicroTec a leading supplier of equipment and process solution for the semiconductor industry and related markets, today announced that it has entered into a joint development and exclusive license agreement with Rolith, Inc. to develop and build nanostructuring equipment employing a disruptive nanolithography method developed by Rolith.

3 Dec 2010

TowerJazz Honors Toppan Photomasks as 2010 Supplier of the Year

Toppan Photomasks, Inc. announced today that it has received the 2010 Supplier of the Year Award from TowerJazz, the global specialty foundry leader. Toppan was selected for the award from TowerJazz’s extensive ...

From Toppan Photomasks Inc. 3 Dec 2010