Nanolithography News

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Increased Customer Acceptance of ASML's Holistic Lithography Solutions

ASML Holding NV (ASML) (NASDAQ:ASML) (Amsterdam:ASML) today at SEMICON West announces broad customer adoption of holistic lithography products which optimize semiconductor scanner performance and provide a faster st...

14 Jul 2010

Pall to Introduce New High Area Filter for Photolithography at SEMICON

Pall Corporation, a finalist for the coveted SEMICON West Sustainable Technologies Award, will showcase its expanding line of green filtration and purification technologies for microelectronics manufacturers from July 13th-15th at SEMICON West.

9 Jul 2010

Carl Zeiss, SEMATECH Partner to Design Metrology Tool for EUV Photomasks

SEMATECH and Carl Zeiss today announced their agreement to design and develop the industry’s first-ever actinic aerial image metrology system (AIMS™) for defect review of EUV photomasks.

9 Jul 2010

International EUVL Workshop Highlights Advantages and Challenges of EUV Lithography

Extreme ultraviolet lithography (EUVL) is the semiconductor industry's best bet for extending Moore's Law and its inherent advantages make it an increasingly preferable choice for next-generation patterning, ranking technologists agreed at the 2010 International Workshop on EUV Lithography.

29 Jun 2010

Nanoelectronics Experts to Present at SEMICON West 2010 in California

SEMATECH and International SEMATECH Manufacturing Initiative (ISMI) will highlight current research through a wide range of lectures and workshop sessions from July 13-15, in conjunction with SEMICON West 2010 in San Francisco, CA.

22 Jun 2010

Simple Technique to Produce Nanowires

Scientists have made a breakthrough toward creating nanocircuitry on graphene, widely regarded as the most promising candidate to replace silicon as the building block of transistors.

11 Jun 2010

SUSS Launches New Dedicated Lithography Solution for HB-LED Production

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, today introduced the next generation of its MA100e mask aligner, a dedicated lithography solution for manufacturing high-brightness light emitting diodes (HB-LEDs).

From SUSS MicroTec AG 9 Jun 2010

New Report on Commercial Lithographic Printing Industry in the U.S.

Research and Markets (http://www.researchandmarkets.com/research/051851/2010_u_s_commerci) has announced the addition of the "2010 U.S. Commercial Lithographic Printing Industry Report" report to their offering. ...

5 Jun 2010

SEMATECH Announces New Collaboration to Address Resist Issues in EUV Lithography

SEMATECH, a global consortium of chipmakers, and AZ Electronic Materials, the global supplier of electronic materials to the semiconductor and flat panel display industries, announced today that AZ Electronic Materials has joined SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

3 Jun 2010

Global Experts to Discuss Lithography Development at SEMATECH’s Litho Forum

At SEMATECH’s Litho Forum, May 10-12, semiconductor business leaders and technology experts gained valuable insight on the industry’s perceptions about and intentions for lithography development.

25 May 2010