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Cambridge NanoTech Announces Expansion of Management Team

Cambridge NanoTech, world leader in Atomic Layer Deposition (ALD) science and equipment for research and industry, today announced that it has expanded its leadership team with the promotion of Dr. Ganesh Sundaram to Vic...

1 Dec 2008

Applied Materials Introduces Aera2 for Lithography to Improve Wafer Critical Dimension Uniformity

Applied Materials, Inc. today announced its Applied Aera2(TM) for Lithography system. Using the system's IntenCD(TM) technology in the fab, semiconductor manufacturers can improve wafer critical dimension uniformity (CDU) by more than 20%, increasing device yield and lowering the per-wafer cost of patterning.

From Applied Materials Inc. 30 Nov 2008

SMEs Having Huge Impact on the World Standing of European Research

SMEs can have a huge impact on the world standing of European research. Just look at the work of IMS Nanofabrication, a brilliant star in the semiconductor constellation. And Europe's research funding programme has h...

27 Nov 2008

CEA-LETI Extends Transistor Dimension Scaling Using 3D Nanowire FET

CEA-LETI has successfully integrated on the same SOI wafer different types of advanced transistor structures like stacked nanowires transistors, FINFETs and independent dual gate FET, using a common flow compatible with standard planar FDSOI devices.

From CEA-Leti 27 Nov 2008

Book Discusses Principles Governing Various Unconventional Nanopatterning Techniques

Research and Markets has announced the addition of John Wiley and Sons Ltd's new report "Unconventional Nanopatterning Techniques and Applications" to their offering. Patterning or lithography is at the...

27 Nov 2008

Researchers Develop Promising Solution to "Mask-Less" Semiconductor Lithography

European researchers have developed a promising solution to 'mask-less' semiconductor lithography and generated intense interest among major industry players. Mask-less lithography (ML2) promises to rapidly reduce the costs and production times associated with low-volume device manufacture and prototyping.

26 Nov 2008

Elpida Memory Completes Development of 50nm Process DDR3 SDRAM

Elpida Memory, Inc.(TOKYO:6665), Japan's leading global supplier of Dynamic Random Access Memory (DRAM), today announced that it has completed development of a 50nm process DDR3 SDRAM. The new DRAM product features t...

26 Nov 2008

Vistec Lithography Announces Acceptance of Vistec EBPG5000plus by University of Toronto

Vistec Lithography Inc. announced that one of its Vistec EBPG5000plus was accepted by the University of Toronto (UofT). The Gaussian Beam Lithography System will offer a wide range of application areas for the Faculty of Applied Science and Engineering and the Emerging Communications Technology Institute at the Canadian University (ECTI).

25 Nov 2008

Leading Nanotechnology Company Opens Global Headquarters and Leading-Edge Manufacturing Facility

Combined with its world-class research and development center located at the UAlbany NanoCollege, Vistec becomes the first high-tech equipment supplier to move its entire operation to New York's Capital Region.

25 Nov 2008

SRAM With HK/MG Process Has Yielded, Complements Foundry's 32/28nm Technology

UMC (NYSE:UMC)(TSE:2303), a leading global semiconductor foundry, today announced a significant milestone for its high-k/metal-gate (HK/MG) technology with validation of the process through 45nm SRAM product yield. This ...

25 Nov 2008

Nanolithography News

Cambridge NanoTech Announces Expansion of Management Team

Applied Materials Introduces Aera2 for Lithography to Improve Wafer Critical Dimension Uniformity

SMEs Having Huge Impact on the World Standing of European Research

CEA-LETI Extends Transistor Dimension Scaling Using 3D Nanowire FET

Book Discusses Principles Governing Various Unconventional Nanopatterning Techniques

Researchers Develop Promising Solution to "Mask-Less" Semiconductor Lithography

Elpida Memory Completes Development of 50nm Process DDR3 SDRAM

Vistec Lithography Announces Acceptance of Vistec EBPG5000plus by University of Toronto

Leading Nanotechnology Company Opens Global Headquarters and Leading-Edge Manufacturing Facility

SRAM With HK/MG Process Has Yielded, Complements Foundry's 32/28nm Technology

Carbon Dioxide to 3D Printed Carbon Nanocomposites: A Sustainable Innovation

Calcium Carbonate Nanoparticles: Boosting T Cell Activation in Cancer Therapy

Emergent Quantum Phenomena in Self-Organized Graphene Systems

Harnessing Biology for Sustainable Energy Production

Feasibility Study with Evonik Confirms LEON’s FR-JET Technology’s Performance in Advanced Nanoparticle Manufacturing for Drug Delivery

Conversations on AFM: Applications of BioAFM in Life Science

Conversations on AFM: The Technology and History Behind AFM and SPM

Recent Advances in High-Speed Atomic Force Microscopy to Improve Research Into Protein Dynamics

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