Nanofabrication News

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CEA-Leti, ASELTA to Develop E-Beam Proximity Effects Correction Solutions for Maskless Lithography

CEA-Leti and ASELTA Nanographics, its newly incorporated startup, today announced they will jointly develop e-beam proximity effects correction solutions for both mask writing and maskless lithography (ML2) applications.

From CEA-Leti 25 Feb 2011

NIST Scientists Confirm That Etched Quantum Dots Work as Sources of Single Photons

Like snowflakes or fingerprints, no two quantum dots are identical. But a new etching method for shaping and positioning these semiconductor nanocrystals might change that.

From National Institute of Standards and Tech (NIST) 25 Feb 2011

USHIO to Start Marketing New Nano-Imprint Vacuum Ultra Violet Ashing System

USHIO America, Inc., today announced that the company plans to start marketing the nano-imprint VUV (Vacuum Ultra Violet) ashing system "CHIPs (Compact HiPower System)" in the US on March 1, 2011.

24 Feb 2011

Successful Installation of PV-480 Coating System for Thin-Film Solar Production

Ultrasonic Systems, Inc. announces the installation of a PV-480 coating system at a US-based CdTe solar panel manufacturer.

24 Feb 2011

eBeam's Advancements in Maskless Lithography to be Presented at SPIE Symposium

The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will present the latest breakthroughs in DFEB mask and direct write technology at the Annual SPIE Advanced Lithography Symposium 2011.

From Vistec Electron Beam 23 Feb 2011

EV Group Launches EVG620HBL Mask Alignment System

STRATEGIES IN LIGHT -- EV Group (EVG), a leading supplier of wafer-bonding and lithography equipment for the advanced semiconductor and packaging, MEMS, silicon-on-insulator (SOI) and emerging nanotechnology markets, today announced the latest addition to its portfolio of products created to optimize the manufacture of high-brightness light-emitting diodes (HB-LEDs), compound semiconductors and power electronics.

From EV Group 23 Feb 2011

Professor Develops Bio-Inspired Sensors Using Nanofabrication Technology

To build the next generation of sensors – with applications ranging from medical devices to robotics to new consumer goods – Chang Liu looks to biology.

21 Feb 2011

Lithography Advances by SEMATECH to be Presented at SPIE Conference

SEMATECH experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithography, and related areas of metrology at the SPIE Advanced Lithography 2011 conferences on February 27 – March 3 at the San Jose Convention Center and Marriott in San Jose, CA.

18 Feb 2011

Oxford Instruments Plasma Technology Announce Dates for 2011 Seminars

Following the success of last year’s seminar and workshop programme, Oxford Instruments Plasma Technology will again hold several similar events this year in conjunction with key research institutes & universities globally.

From Oxford Instruments Plasma Technology 17 Feb 2011

Nanometrics to Provide UniFire Metrology System for Advanced 3D Wafer-Scale Packaging

Nanometrics Incorporated a leading provider of advanced process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics, today announced that a leading semiconductor foundry has ordered a UniFire(TM) 7900 metrology system for advanced 3D wafer-scale packaging process control.

17 Feb 2011