Nanofabrication News

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OLED Encapsulation Company, PlasmaSi, Acquired by AIXTRON

AIXTRON SE, one of the world’s leading manufacturers of deposition systems for the semiconductor industry, today announced that it has acquired privately held Silicon Valley-based PlasmaSi, Inc. effective April 1, 2015. The purchase price may reach up to $16 million and will be paid in cash.

From AIXTRON SE 8 Apr 2015

Collective, Fast Diffusion Method to Grow Perfect, Tiny Metal Nanostructures

“The textbook said we should see slow, gradual and random. But what we saw? BOOM! Fast, explosive and organized!” said Michael Tringides, physicist at the U.S. Department of Energy’s Ames Laboratory and a professor of physics and astronomy at Iowa State University.

8 Apr 2015

Researchers Produce Nanowires Using Meniscus-Mask Lithography

Water is the key component in a Rice University process to reliably create patterns of metallic and semiconducting wires less than 10 nanometers wide.

8 Apr 2015

TSMC Certifies Cadence Digital and Custom/Analog Tools for 10nm FinFET DRM and SPICE Models

Cadence Design Systems, Inc. today announced that its digital and custom/analog tools have achieved certification from TSMC for its most current version of 10-nanometer (nm) FinFET Design Rule Manual (DRM) and SPICE models.

8 Apr 2015

ATopTech Continues Collaboration with TSMC to Certify Aprisa, Apogee Solutions for 10nm Process Technology

ATopTech, the leader in next generation physical design solutions, is collaborating with TSMC to certify Aprisa™ and Apogee™, ATopTech’s place and route solutions, for TSMC 10nm process technology.

8 Apr 2015

Mentor Graphics and TSMC Reach First Milestone in 10nm EDA Certification Collaboration

Mentor Graphics Corp. today announced that TSMC and Mentor Graphics have reached the first milestone of their collaboration on 10nm EDA certification. Calibre® physical verification and design for manufacturing (DFM) platform, and the Analog FastSPICE™ (AFS™) Circuit Verification Platform, including AFS Mega, are certified by TSMC based on the most current version of 10nm design rules and SPICE models.

8 Apr 2015

Lubricant Based on Nanoparticles and Ionic Liquids for Extreme Conditions

In the world of the tiny zebrafish, the predatory red tiger oscar is the stuff of nightmares. And while the species has no natural reason to fear robots, researchers at the NYU Polytechnic School of Engineering have published the first study showing that, in a side-by-side comparison, a robotic predator can spook zebrafish just as well as the real thing. Their results may help advance understanding of fear and anxiety in animal populations, including humans.

7 Apr 2015

Synopsys Design Tools Receive TSMC Certification for 16nm FinFET Plus Production and 10nm Early Design Starts

Synopsys, Inc. today announced that TSMC has concluded 16-nanometer FinFET Plus (16FF+) v1.0 certification and reached the first milestone of 10-nanometer (nm) certification based on the most current DRM and SPICE model on a comprehensive list of Synopsys' custom and digital design tools.

From Synopsys, Inc. 7 Apr 2015

Bruker Announces Official Partnership with University of Manchester’s National Graphene Institute

Bruker Corporation today announced an official partnership with the University of Manchester’s National Graphene Institute (NGI), joining a select list of industrial collaborators.

7 Apr 2015

ANSYS RedHawk and Totem Products Receive TSMC Certification for 10nm FinFET DRM and SPICE Models

ANSYS, Inc. announced today that its ANSYS® RedHawk™ and ANSYS Totem™ products are certified by TSMC for the most current version of 10-nanometer (nm) FinFET Design Rule Manual (DRM) and SPICE models, addressing the power and performance requirements for mobile, computing and networking applications.

7 Apr 2015

Nanofabrication News

OLED Encapsulation Company, PlasmaSi, Acquired by AIXTRON

Collective, Fast Diffusion Method to Grow Perfect, Tiny Metal Nanostructures

Researchers Produce Nanowires Using Meniscus-Mask Lithography

TSMC Certifies Cadence Digital and Custom/Analog Tools for 10nm FinFET DRM and SPICE Models

ATopTech Continues Collaboration with TSMC to Certify Aprisa, Apogee Solutions for 10nm Process Technology

Mentor Graphics and TSMC Reach First Milestone in 10nm EDA Certification Collaboration

Lubricant Based on Nanoparticles and Ionic Liquids for Extreme Conditions

Synopsys Design Tools Receive TSMC Certification for 16nm FinFET Plus Production and 10nm Early Design Starts

Bruker Announces Official Partnership with University of Manchester’s National Graphene Institute

ANSYS RedHawk and Totem Products Receive TSMC Certification for 10nm FinFET DRM and SPICE Models

Biochar-Modified Titanium Dioxide Nanocomposites for Enhanced Water Treatment

Boosting Hydrogen Fuel Production with TiO2 and Copper-Based MOFs

New Nanocage Material Removes Up to 90% of Toxic PFAS from Water

Enhancing Chitosan Films with Silanized Hexagonal Boron Nitride for Sustainable Applications

N-Doped Ti3O5: Enhanced Photocatalytic Removal of Phenolic Compounds from Wastewater

Overcoming Nanogold Production Challenges

Electrospinning and the Future of Nanotechnology

How Electrospinning is Shaping the Future of Nanotechnology

Sponsored Content

Utilizing Back-Gate Voltage Biases for 2D Materials

Resistivity Metrology for Sputtered ITO Thin Films

How Plasma Cleaning Technology Tackles Hydrocarbon Contamination

Optimizing EV Lubricants with Electrified Tribotesting