ATopTech Continues Collaboration with TSMC to Certify Aprisa, Apogee Solutions for 10nm Process Technology

ATopTech, the leader in next generation physical design solutions, is collaborating with TSMC to certify Aprisa™ and Apogee™, ATopTech’s place and route solutions, for TSMC 10nm process technology.

ATopTech has long collaborated with TSMC for advanced processes, starting with 28nm and 20nm and moving through 16FinFET (16FF) and 16FinFET+ (16FF+). The success of this continuing collaboration has resulted in ATopTech being designated as a “Partner of the Year” by TSMC in 2012, 2013 and 2014.

Aprisa™ and ApogeeTM advanced physical implementation solutions deliver optimum runtime, quality of results and yield.

“Our continuing collaboration with TSMC at 10nm ensures that Aprisa and Apogee will be ready for joint customers to start evaluations and designs for the 10nm process, giving them an advantage in automatic place-and-route,” said Jue-Hsien Chern, CEO of ATopTech. “As always, it is our pleasure to work with TSMC to ensure the highest possible routability for leading-edge technology nodes.”

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