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TSMC Incorporates Analog FastSPICE Platform in 20 nm Custom Design Reference Flow

Berkeley Design Automation, provider of the world’s fastest nanometer circuit verification, today announced that TSMC has incorporated the Analog FastSPICE Platform in its Custom Design Reference Flow for 20nm Device Noise Analysis and Circuit-Specific Process Corners.

17 Oct 2012

Cadence Solutions Selected for TSMC 20 nm Design Infrastructure

Cadence Design Systems, a leader in global electronic design innovation, announced today that TSMC has selected Cadence® solutions for its 20-nanometer design infrastructure. The solutions cover the Virtuoso® custom/analog and Encounter® RTL-to-signoff platforms.

From Cadence Design Systems 17 Oct 2012

UAlbany NanoCollege Selects M+W Group as Associate Member for Global 450 Consortium

As further demonstration of Governor Andrew Cuomo's nanotechnology-driven innovation economy and its success at attracting global corporations, M+W Group (M+W) announced today that it has been selected by the College of Nanoscale Science and Engineering (CNSE) of the University at Albany, United States, associate member for facilities and infrastructure for the Global 450mm Consortium (G450C), where M+W will spearhead development of new facility and infrastructure technologies and manage building and facility suppliers selected to participate in the G450C program.

17 Oct 2012

Laker-Calibre RealTime Integration Chosen for TSMC 20 nm Custom Design Reference Flow

SpringSoft, and Mentor Graphics® Corporation today announced that the Laker™-Calibre® RealTime custom layout flow with signoff-quality design rule checking (DRC) in real time is selected for the TSMC Custom Design Reference Flow. The Reference Flow addresses 20-nanometer (nm) chip design and verification complexity.

17 Oct 2012

KYOCERA’s New Milling Cutters with MEGACOAT NANO Technology

Kyocera Industrial Ceramics Corporation, Cutting Tool Division recently introduced its new MEW M-Four and MFWN M-Six Milling Cutters, both featuring unique advantages and inserts with MEGACOAT NANO, Kyocera’s new proprietary coating technology for stable cutting and extended tool life.

16 Oct 2012

Novavax Begins Phase 1 Clinical Trial of Nanoparticle-Based RSV Vaccine Candidate

Novavax, today announced that enrollment has begun in a Phase 1 dose-ranging clinical trial of its respiratory syncytial virus (RSV) vaccine candidate in healthy adults 60 years of age and older.

From Novavax Inc. 16 Oct 2012

Nanotechnology-Based Delivery System for Sustained Release of Drugs

pSivida Corp., a leader in developing sustained release, drug delivery products for treatment of back-of-the-eye diseases, today announced that its President and CEO, Dr. Paul Ashton, will discuss “Cross Fertilization: Sustained Delivery and Nanotechnology in Ophthalmology” at an upcoming Formulation and Drug Delivery Committee Meeting of the Massachusetts Biotechnology Council on Wednesday, October 17.

From EyePoint Pharmaceuticals, Inc. 16 Oct 2012

NSF Grant to Penn State to Invigorate Nanotechnology Workforce Development

Penn State will receive $4.2 million over the next three years from the National Science Foundation to continue the work of the National Nanotechnology Applications and Career Knowledge Network (NACK Network), founded at the University with a four-year grant from the NSF in 2008.

16 Oct 2012

Synopsys Teams Up with TSMC on 20 nm Process Technology

Synopsys, a global leader accelerating innovation in the design, verification and manufacture of chips and systems, today announced 20-nanometer (nm) process technology support for the TSMC 20nm Reference flow. This includes Synopsys® Galaxy™ Implementation Platform support for the latest TSMC 20nm design rules and models.

From Synopsys, Inc. 16 Oct 2012

Major Semiconductor Company Places Order for n&k Gemini for EUV Photomask Measurements

n&k Technology Incorporated, a manufacturer of state-of-the-art OCD/scatterometry and thin film metrology systems, today announced that a major semiconductor company in the US has ordered the n&k Gemini for measurements of EUV photomasks.

16 Oct 2012