Nanometrics Integrated Metrology Enhances Fab Build-Out

A semiconductor developer of Japan has recently acquired the IMPULSE integrated metrology (IM) solution from the California-based Nanometrics.

The solution will be used in process control of chemical mechanical polishing (CMP) applications in fab build-out. This follows an earlier order placed by the sane client for the Lynx cluster metrology platform from Nanometrics, which was also available with the IMPULSE platform, to be deployed in in-line optical critical dimension (OCD) monitoring of etch and lithography applications.

According to Steve Bradley, director of Nanometrics’ Integrated Metrology Business Unit, the solution offers rapid and accurate measurements. It has been developed on the lines of the CMP platforms designed by two suppliers of the systems, suitable for use in both dielectric and metal polishing applications. The systems will be deployed in logic, Flash, DRAM and foundry fabs with in-line metrology suitable for lithography, etch, CMP and thin film deposition ideal for device geometries ranging from 65nm to 1x node.

Scope: http://www.nanometrics.com/