Posted in | News | Nanoelectronics

Sidense’s OTP Macros for 90 nm LP Process Meet IP9000 Assessment Requirements

Sidense, a provider of logic one-time programmable (OTP), non-volatile memory (LNVM) IP cores, has declared that its SiPROM 1T-Fuse OTP macro portfolio for the 90 nm low-power (LP) process has fulfilled the requirements of IP9000 assessment program of TSMC.

This accomplishment adds SiPROM 1T-Fuse OTP macro portfolio at 90LP to the expanding list of 1T-OTP products at various process nodes that have already fulfilled the requirements of IP9000 assessment.

SiPROM at a 90 nm LP process offers an IP9000 Assessed OTP system for clients manufacturing ICs at 90 nm for applications such as mobile phones that need low power consumption or transferring designs from 130 nm to this superior density and performance process.

A full line of off-the-shelf 90 nm macros encompassing bit counts ranging between 8 Kb and 512 Kb is available from Sidense. Manufacturers are employing the company’s 1T-OTP macros at 90 nm to store secure keys, substitute ROM and deal configuration-specific information for an extensive range of applications such as SoCs for HDTV, wireless and mobile phones.

Sidense’s Vice President of Operations, Rhéal Gervais stated that the company’s 1T-OTP macros have now fulfilled the challenging IP9000 assessment needs at various TSMC process nodes. As IP9000 assessment will be completed for others in the next few months, the company proves that its 1T-OTP products fulfill the quality and reliability features demanded by its customers for its several current and future process nodes and variants, he added.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Chai, Cameron. (2019, February 12). Sidense’s OTP Macros for 90 nm LP Process Meet IP9000 Assessment Requirements. AZoNano. Retrieved on November 22, 2024 from https://www.azonano.com/news.aspx?newsID=23372.

  • MLA

    Chai, Cameron. "Sidense’s OTP Macros for 90 nm LP Process Meet IP9000 Assessment Requirements". AZoNano. 22 November 2024. <https://www.azonano.com/news.aspx?newsID=23372>.

  • Chicago

    Chai, Cameron. "Sidense’s OTP Macros for 90 nm LP Process Meet IP9000 Assessment Requirements". AZoNano. https://www.azonano.com/news.aspx?newsID=23372. (accessed November 22, 2024).

  • Harvard

    Chai, Cameron. 2019. Sidense’s OTP Macros for 90 nm LP Process Meet IP9000 Assessment Requirements. AZoNano, viewed 22 November 2024, https://www.azonano.com/news.aspx?newsID=23372.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.