ASML's division, Brion Technologies has introduced the Tachyon Model-Based Sub-Resolution Assist Features (MB-SRAF) for its well-known Tachyon computational lithography system to allow full-chip, high-speed processing of sophisticated chip designs at 2x nm nodes.
Tachyon MB-SRAF allows the processing of sophisticated chip designs with minimal development expenditures, higher productivity and larger process windows compared to rule-based alternatives. The larger process window offers wide scope in imaging, which in turn provides devices with increased output.
With devices sizing down to the 2x nm technology nodes, the conventional rule-based method for SRAF position and sizing is complicated, particularly for two-dimensional layers, including metals, vias and contacts. Development times are very long for rule-based SRAFs and need several iterations of wafer print tests and mask tape-outs. However, a powerful and superior quality Tachyon MB-SRAF recipe can be devised and improved within a fraction of this time and expenditure, in almost the same manner that model-based OPC has confirmed its superiority over rule-based OPC.
Model-based SRAF techniques are being developed for quite some time but so far have not been utilized for full-chip applications due to poor correction quality, high computing expenditures and the high impact to mask expenditures caused by the pixelated geometries generated by them. Tachyon MB-SRAF has tackled all those issues and provides extensive design space coverage with in-built conflict resolution feature, SRAF printability prediction and mask rule check compliance for full-chip processing. It is an important process window enabler for chip manufacturers involved in the development and production of designs at £ 2x nm.
Brion Technologies' General Manager, Jim Koonmen stated that full chip MB-SRAF and freeform source mask optimization are critical for patterning two-dimensional layers in future-generation technologies at the 2x nm nodes and beyond. The company's Tachyon MB-SRAF offers a cost-saving solution and allows its customers to tape-out their sophisticated masks on time and with better results, he added.